Abstract: A process is disclosed for controlling the diffusion of aluminum in silicon for the fabrication of monolithic pn junction isolated integrated circuits. Germanium is incorporated into the silicon where isolation or p-well diffusion of aluminum is to occur. Aluminum diffusion is modified by the presence of the germanium so that channeling and out diffusion are controlled. The control is enhanced when boron is incorporated into the silicon along with the aluminum.

Abstract: A P-type buried layer is described for use with planar, silicon, monolithic, epitaxial, PN junction-isolated transistors of PNP conductivity primarily for use in IC construction. The buried layer includes a high concentration of boron and gallium along with germanium, which is in sufficient concentration to inhibit impurity diffusion in the silicon epitaxial layer. This inhibition effect has been found to be sufficient to cause the combination of boron and gallium to act as slow diffusers. The result is that the performance of arsenic and antimony, in the creation of buried layers for NPN transistors. Thus, the performance of NPN transistors can be matched for PNP transistors. This means that an IC can be fabricated so that more nearly equal performance NPN and PNP transistors can be fabricated simultaneously in a common substrate.