Abstract: A method of automating a process for controlling a voltage waveform applied to an object is provided. A first waveform for applying to the object is received. A first FFT of the first waveform is calculated. A second waveform for input to the waveform generator is determined based on the first waveform. The determined second waveform is sent to a waveform generator. A third waveform is received that is measured across the object based on a waveform generated by the waveform generator. A second FFT of the received third waveform is calculated. The third waveform is compared with the first waveform to determine a convergence status of the third waveform. If the determined convergence status is not converged, an updated waveform is calculated based on the first FFT and the second FFT and the process is repeated with the updated waveform as the determined second waveform.

Abstract: A method of automating a process for controlling a voltage waveform applied to an object is provided. A first waveform for applying to the object is received. A first FFT of the first waveform is calculated. A second waveform for input to the waveform generator is determined based on the first waveform. The determined second waveform is sent to a waveform generator. A third waveform is received that is measured across the object based on a waveform generated by the waveform generator. A second FFT of the received third waveform is calculated. The third waveform is compared with the first waveform to determine a convergence status of the third waveform. If the determined convergence status is not converged, an updated waveform is calculated based on the first FFT and the second FFT and the process is repeated with the updated waveform as the determined second waveform.