Abstract: A method of enhancing the lithographic resolution of randomly laid out isolated structures is disclosed. A first mask comprises an active layer with isolated features such as gates. Portions of the active layer have a reduced dimension typical of periodic structures. The first mask additionally has complementary features provided along side the reduced active features to provide periodicity. In this way, the resolution of the lithographic process is enhanced, and other enhanced resolution technologies additionally can be used to best advantage to form a patterned photosensitive layer having isolated features of reduced width. The photosensitive layer is then exposed to a second mask which exposes the complementary features so that they are removed from the latent image in the photosensitive layer. This second exposure also further improves resolution by enhancing the contrast between exposed and unexposed regions.

Abstract: A memory device having test circuitry incorporated into its design to enable direct external access to the bit lines of a single cell is described. When the device is put in test mode by applying external control signals, peripheral I/O circuitry is disabled. Once the I/O circuitry is disabled the test circuitry selects and enables the section of the array in which the selected cell is located through transfer circuits. The enabled transfer circuit for the selected section couples data between the selected cell and a set of predetermined I/O terminals.