Abstract: The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.

Abstract: A system and method for determining and removing contamination recognizes the need to determine contamination caused by a plurality of contaminants which includes refractory compounds, high molecular weight compounds and low molecular compounds operating at different rates. The system in accordance with a preferred embodiment of the present invention includes a collection device that emulates the environment of the surfaces of certain optical elements. The method for determining and preferably removing contamination includes maintaining an extended duration sampling time to enable the collection of a desirable mass of high molecular weight compounds. In a preferred embodiment, the collection device is operated past a breakthrough capacity to quantitatively measure high molecular weight compounds and other contaminants.

Abstract: A system and method for determining and removing contamination recognizes the need to determine contamination caused by a plurality of contaminants which includes refractory compounds, high molecular weight compounds and low molecular compounds operating at different rates. The system in accordance with a preferred embodiment of the present invention includes a collection device that emulates the environment of the surfaces of certain optical elements. The method for determining and preferably removing contamination includes maintaining an extended duration sampling time to enable the collection of a desirable mass of high molecular weight compounds. In a preferred embodiment, the collection device is operated past a breakthrough capacity to quantitatively measure high molecular weight compounds and other contaminants.

Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

Abstract: A semiconductor catalyst is metalized in situ on a reaction support surface by illuminating at least a portion of the catalyst in the presence of a suitable source of metal to selectively deposit the metal on the illuminated portions. The source of metal can be applied to the reaction support surface either with the catalyst or separately, but is not attached to the catalyst until the structure is illuminated. This causes the metal to be deposited where the catalyst will be illuminated during use and therefore where photopromoted catalytic degradation can occur.

Abstract: A fibrous matte web is used to support a semiconductor catalyst for use in the photopromoted catalyzed degradation of compounds in a fluid stream. The catalyst, which may be a transition metal oxide, is affixed to at least one side of the matte web, and preferably the downstream side thereof. In one embodiment, the matte web is comprised of a plurality of fibers of glass or other suitable material permitting fluid to pass therethrough, and the side or sides containing the catalyst are directly illuminated by a suitable light source.