Patents by Inventor Andelko KATALENIC

Andelko KATALENIC has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10580545
    Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: March 3, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Petrus Rutgerus Bartraij, Ramon Pascal Van Gorkom, Lucas Johannes Peter Ament, Pieter Willem Herman De Jager, Gosse Charles De Vries, Rilpho Ludovicus Donker, Wouter Joep Engelen, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Erik Roelof Loopstra, Han-Kwang Nienhuys, Andrey Alexandrovich Nikipelov, Michael Jozef Mathijs Renkens, Franciscus Johannes Joseph Janssen, Borgert Kruizinga
  • Patent number: 10103508
    Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: October 16, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
  • Publication number: 20170264071
    Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
    Type: Application
    Filed: May 19, 2017
    Publication date: September 14, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
  • Patent number: 9728931
    Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
    Type: Grant
    Filed: November 27, 2014
    Date of Patent: August 8, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op'T Root
  • Publication number: 20160301180
    Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
    Type: Application
    Filed: November 27, 2014
    Publication date: October 13, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Johannes Antonius Gerardus AKKERMANS, Erik LOOPSTRA, Wouter Joep ENGELEN, Petrus Rutgerus BARTRAIJ, Teis Johan COENEN, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
  • Publication number: 20160225477
    Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
    Type: Application
    Filed: September 24, 2014
    Publication date: August 4, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich BANINE, Peturs Rutgerus BARTRAIJ, Ramon Pascal VAN GORKOM, Lucas Johannes Peter AMENT, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Rilpho Ludovicus DONKER, Wouter Joep ENGELEN, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Erik Roelof LOOPSTRA, Han-Kwang NIENHUYS, Andrey Alexandrovich NIKIPELOV, Michael Jozef Mathijs RENKENS, Franciscus Johannes Joseph JANSSEN, Borgert KRUIZINGA