Patents by Inventor Andre Schepp

Andre Schepp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for determining positions of structures on a mask
    Patent number: 8248618
    Abstract: A method for determining the positions of structures (3) on a mask (2) is disclosed. The method is implemented in a metrology tool (1) comprising a measurement table (20) which is movable in X-coordinate direction and Y-coordinate direction. A first intensity profile (IX) is recorded along a first measurement direction (MRX), which is parallel to the X-coordinate direction. A second intensity profile (IY) is recorded along a second measurement direction (MRY), which is parallel to the Y-coordinate direction. A two-dimensional position of a centre of gravity (S) with respect to the coordinate system of the metrology tool (1) is determined from the first intensity profile (IX) and the second intensity profile (IY).
    Type: Grant
    Filed: January 19, 2010
    Date of Patent: August 21, 2012
    Assignee: Vistec Semiconductor Systems GmbH
    Inventors: Klaus Rinn, Andreas Schaaf, Andre Schepp
  • Method for Determining Positions of Structures on a Mask
    Publication number: 20100220339
    Abstract: A method for determining the positions of structures (3) on a mask (2) is disclosed. The method is implemented in a metrology tool (1) comprising a measurement table (20) which is movable in X-coordinate direction and Y-coordinate direction. A first intensity profile (IX) is recorded along a first measurement direction (MRX), which is parallel to the X-coordinate direction. A second intensity profile (IY) is recorded along a second measurement direction (MRY), which is parallel to the Y-coordinate direction. A two-dimensional position of a centre of gravity (S) with respect to the coordinate system of the metrology tool (1) is determined from the first intensity profile (IX) and the second intensity profile (IY).
    Type: Application
    Filed: January 19, 2010
    Publication date: September 2, 2010
    Applicant: VISTEC SEMICONDUCTOR SYSTEMS GMBH
    Inventors: Klaus Rinn, Andreas Schaaf, Andre Schepp