Abstract: The present invention relates to a process for preparing a crystalline solid from glycine-N,N-diacetic acid derivatives (e.g., MGDA) of sufficiently low hygroscopicity, which is characterized in that at least one crystalline compound of the formula I is introduced as seed, and a spray granulation is carried out with at least one compound of the formula I, preferably followed by a heat treatment.

Abstract: The present invention relates to a process for preparing a crystalline solid from glycine-N,N-diacetic acid derivatives (e.g., MGDA) of sufficiently low hygroscopicity, which is characterized in that at least one crystalline compound of the formula I is introduced as seed, and a spray granulation is carried out with at least one compound of the formula I, preferably followed by a heat treatment.

Abstract: The present invention relates to a process for preparing a crystalline solid from glycine-N,N-diacetic acid derivatives (e.g., MGDA) of sufficiently low hygroscopicity, which is characterized in that at least one crystalline compound of the formula I is introduced as seed, and a spray granulation is carried out with at least one compound of the formula I, preferably followed by a heat treatment.

Abstract: The present invention relates to a solid with sufficiently low hygroscopicity which comprises glutamic acid-N,N-diacetic acid (GLDA) or derivatives and/or salts thereof, and a method for its production.

Abstract: The present invention relates to a solid with sufficiently low hygroscopicity which comprises glutamic acid-N,N-diacetic acid (GLDA) or derivatives and/or salts thereof, and a method for its production.

Abstract: The present invention relates to a process for preparing a crystalline solid from glycine-N,N-diacetic acid derivatives (e.g., MGDA) of sufficiently low hygroscopicity, which is characterized in that at least one crystalline compound of the formula I is introduced as seed, and a spray granulation is carried out with at least one compound of the formula I, preferably followed by a heat treatment.

Abstract: A process for the production of strongly adherent coatings on an inorganic or organic substrate is provided, wherein in a first step a) a low temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more photoinitiators or mixtures of photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied at normal pressure to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and irradiated with electromagnetic waves and, optionally, in a fourth step d1) the substrate so pretreated is provided with a coating and the coating is cured or dried.

Abstract: The invention relates to a method for forming functional layers on an inorganic or organic substrate, wherein a) a low-temperature plasma, a corona discharge, high-energy radiation and/or a flame treatment is caused to act on the inorganic or organic substrate, b) 1) at least one activatable initiator or 2) at least one activatable initiator and at least one ethylenically unsaturated compound is/are applied in the form of a melt, solution, suspension or emulsion to the inorganic or organic substrate, there being incorporated in the activatable initiator and/or the ethylenically unsaturated compound at least one function-controlling group which results in the treated substrate's acquiring desired surface properties, and c) the coated substrate is heated and/or is irradiated with electromagnetic waves, the substrate thereby acquiring the desired surface properties. The invention relates also to substrates coated in accordance with the method and to their use.

Abstract: The invention relates to a method for forming coatings on an inorganic or organic substrate and to substrates coated in accordance with the method. In the method: a) a low-temperature plasma, a corona discharge, high-energy radiation and/or a flame treatment is caused to act on the inorganic or organic substrate, b) 1.) at least one activatable initiator or 2.

Abstract: A process for forming UV absorber layers on an inorganic or organic substrate is described. That process comprises a) allowing a low-temperature plasma, a corona discharge or high-energy radiation to act on the inorganic or organic substrate, b) applying to the treated inorganic or organic substrate at least one free-radical-forming initiator and at least one UV absorber containing at least one ethylenically unsaturated group, and, optionally in the form of melts, solutions, suspensions or emulsions, at least one synergist and/or at least one ethylenically unsaturated compound, c) heating the coated substrate and/or irradiating it with electromagnetic waves. The invention relates also to a substrate provided with a UV absorber layer in accordance with that process. That process substantially eliminates vacuum conditions and excessive thermal stress or energy stress and also destruction of the UV absorber.

Abstract: The invention relates to a process and to the corresponding apparatus for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step: a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step: b) one or more photoinitiators or mixtures of photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied at normal pressure to the inorganic or organic substrate, in a third step: c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) the substrate so pretreated is provided with a coating and the coating is cured or dried.