Patents by Inventor Andreas Kloppel

Andreas Kloppel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150214018
    Abstract: A method for coating a substrate by means of a cathode arrangement including at least two rotatable cathodes is disclosed. The method includes rotating at least one of the at least two rotatable cathodes in a first direction, and, at the same time, rotating at least one of the at least two rotatable cathodes in a second direction. The first direction is opposite to the second direction. Furthermore, a controller for controlling a coating process is disclosed. Furthermore, a coater for coating a substrate is disclosed. The coater includes a cathode arrangement with at least two rotatable cathodes and a controller as disclosed herein.
    Type: Application
    Filed: May 29, 2012
    Publication date: July 30, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Evelyn Scheer, Markus Hanika, Konrad Schwanitz, Fabio Pieralisi, Andreas Klöppel, Jian Liu, Andreas Lopp
  • Publication number: 20120107504
    Abstract: A deposition system is provided which is adapted for depositing a thin film onto a substrate. The deposition system includes a substrate carrier adapted for carrying the substrate and at least one tilted evaporator crucible. The at least one tilted evaporator crucible is adapted for directing evaporated deposition material towards the substrate in a main emission direction. The main direction emission of the tilted evaporator crucible is different from a direction normal to the substrate.
    Type: Application
    Filed: October 29, 2010
    Publication date: May 3, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Philipp MAURER, Sven SCHRAMM, Andreas LOPP, Andreas KLÖPPEL
  • Patent number: 7285342
    Abstract: A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 ??cm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined BF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.
    Type: Grant
    Filed: November 11, 2004
    Date of Patent: October 23, 2007
    Assignee: Unaxis Deutschland GmbH
    Inventors: Andreas Klöppel, Jutta Trube
  • Publication number: 20070028629
    Abstract: The invention relates to an evaporator arrangement with a crucible, wherein the crucible is divided into at least two zones, each of which is heated to different temperatures. The first zone is a melt-down zone and the second zone the evaporation zone proper. The evaporator arrangement is preferably for the evaporation of metals. If metals are evaporated, a metal wire is preferably guided into the melt-down zone. However, metal alloys can also be evaporated thereby that one or several metal wires comprised of different materials are guided into the melt-down zone. Between the melt-down zone and the evaporator zone a heating zone may be provided.
    Type: Application
    Filed: June 8, 2006
    Publication date: February 8, 2007
    Inventors: Gunter Klemm, Marcus Bender, Ulrich Englert, Andreas Kloppel, Uwe Hoffmann, Hans-Georg Lotz, Stefan Hein, Stefan Keller
  • Publication number: 20050175862
    Abstract: A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 ??cm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined BF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.
    Type: Application
    Filed: November 11, 2004
    Publication date: August 11, 2005
    Inventors: Andreas Kloppel, Jutta Trube
  • Patent number: 6905776
    Abstract: On a glass substrate, a base layer of indium cerium oxide is deposited, and on this a thin copper-containing silver layer, both produced by means of DC sputtering. On top there is another indium cerium oxide layer, which is produced by means of AC-superimposed DC sputter deposition. This layer system boasts very low surface resistivity combined with high transparency in the visible part of the spectrum, which means it has a high Haacke quality factor.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: June 14, 2005
    Assignee: BPS Alzenau GmbH
    Inventors: Johannes Stollenwerk, Andreas Klöppel, Marcus Bender
  • Patent number: 6849165
    Abstract: A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 ??cm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined HF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.
    Type: Grant
    Filed: May 4, 2001
    Date of Patent: February 1, 2005
    Assignee: Unaxis Deutschland GmbH
    Inventors: Andreas Klöppel, Jutta Trube
  • Publication number: 20040163600
    Abstract: A vapor deposition device for vapor deposition of vertically aligned regions of a substrate has an upright, electrically heated melting crucible having an electrical heater for the material to be vaporized. A nozzle pipe, which is separate from the melting crucible and is sealable on top, having a vapor outlet for vapor deposition of the substrate, is seated on the melting crucible. The nozzle pipe has a heater which is independent of the heater of the melting crucible.
    Type: Application
    Filed: November 24, 2003
    Publication date: August 26, 2004
    Inventors: Uwe Hoffmann, Andreas Kloppel, Andreas Jischke, Peter Sauer
  • Publication number: 20030170449
    Abstract: A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 &mgr;&OHgr;cm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined HF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.
    Type: Application
    Filed: May 1, 2003
    Publication date: September 11, 2003
    Inventors: Andreas Kloppel, Jutta Trube