Patents by Inventor Andreas Wurmbrand
Andreas Wurmbrand has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120120377Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: January 23, 2012Publication date: May 17, 2012Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Christiaan Alexander HOOGENDAM, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Publication number: 20120086926Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: December 12, 2011Publication date: April 12, 2012Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
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Patent number: 8102502Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: April 10, 2009Date of Patent: January 24, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Publication number: 20110255181Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: June 28, 2011Publication date: October 20, 2011Applicant: CARL ZEISS SMT GMBHInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7995296Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: GrantFiled: July 6, 2010Date of Patent: August 9, 2011Assignee: Carl Zeiss SMT GmbHInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Publication number: 20100271716Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: July 6, 2010Publication date: October 28, 2010Applicant: CARL ZEISS SMT AGInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7768723Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: GrantFiled: March 10, 2009Date of Patent: August 3, 2010Assignee: Carl Zeiss SMT AGInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7649702Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.Type: GrantFiled: January 25, 2008Date of Patent: January 19, 2010Assignees: Carl Zeiss SMT AG, ASML Netherlands B.V.Inventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
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Publication number: 20090197211Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: April 10, 2009Publication date: August 6, 2009Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Christiaan Alexander HOOGENDAM, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Patent number: 7570343Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.Type: GrantFiled: November 23, 2005Date of Patent: August 4, 2009Assignee: Carl Zeis SMT AGInventors: Aurelian Dodoc, Karl Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer, Bernhard Gellrich, Juergen Fischer, Susanne Beder, Andreas Wurmbrand, Ulrich Loering, Albrecht Ranck
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Publication number: 20090168207Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: March 10, 2009Publication date: July 2, 2009Applicant: Carl Zeiss SMT AGInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Publication number: 20090122288Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).Type: ApplicationFiled: November 20, 2008Publication date: May 14, 2009Applicant: CARL ZEISS SMT AGInventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
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Patent number: 7532304Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: January 29, 2008Date of Patent: May 12, 2009Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
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Patent number: 7515363Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: GrantFiled: August 28, 2007Date of Patent: April 7, 2009Assignee: Carl Zeiss SMT AGInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7471469Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).Type: GrantFiled: September 22, 2005Date of Patent: December 30, 2008Assignee: Carl Zeiss SMT AGInventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
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Publication number: 20080212211Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.Type: ApplicationFiled: January 25, 2008Publication date: September 4, 2008Applicant: CARL ZEISS SMT AGInventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
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Publication number: 20080204679Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: January 29, 2008Publication date: August 28, 2008Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
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Patent number: 7352433Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: October 12, 2004Date of Patent: April 1, 2008Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
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Publication number: 20080002170Abstract: A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.Type: ApplicationFiled: November 22, 2004Publication date: January 3, 2008Inventors: Bernhard Gellrich, Andreas Wurmbrand, Jens Kugler, Armin Schoeppach, Christian Zengerling, Stephane Bruynooghe
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Publication number: 20070297074Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: August 28, 2007Publication date: December 27, 2007Inventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner