Abstract: An AC power feed device for conducting electrical power from a source to a load. The feed device has a constant characteristic impedance along its length and an outer periphery that varies in size progressively along its length, or the feed device has an input end connected to the match network and an output end connected to an electrode, and has a characteristic impedance which varies from a value substantially equal to the output impedance of a match network coupled at the input end to a value equal to the impedance of the electrode.

Abstract: An electrode assembly (50) and an associated plasma reactor system (10) and related methods for a variety of plasma processing applications. The electrode assembly provides control of a plasma density profile (202) within an interior region (30) of a plasma reactor chamber (20). The electrode assembly includes an upper electrode (54) having a lower surface (54L), an upper surface (54U) and an outer edge (54E). The lower surface of the upper electrode faces interior region of the plasma chamber housing the plasma (200), and thus interfaces with the plasma. The electrode assembly further includes a segmented electrode (60) arranged proximate to and preferably substantially parallel with the upper surface of the upper electrode. The segmented electrode comprises two or more separated electrode segments (62a, 62b, . . . 62n), each having an upper and lower surface. Each electrode segment is spaced apart from the upper electrode upper surface by a corresponding controlled gap (Ga, Gb, . . . Gn).