Abstract: A modular-construction vacuum-coating system includes a plurality of functional chambers arranged one behind the other along a longitudinal extent in which substrates are moved through the chambers in a substrate-transporting region. To lower the production-related and installation-related outlay involved in supplying media, a functional chamber, as a first submodule, is arranged in a first module and provided with an outer interface which is the same for at least a second module.

Abstract: A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.

Abstract: Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.

Abstract: A modular-construction vacuum-coating system includes a plurality of functional chambers arranged one behind the other along a longitudinal extent in which substrates are moved through the chambers in a substrate-transporting region. To lower the production-related and installation-related outlay involved in supplying media, a functional chamber, as a first sub-module, is arranged in a first module and provided with an outer interface which is the same for at least a second module.

Abstract: A device for controlling the temperature of substrates in a substrate-treatment system, in which a substrate can be guided in the longitudinal extension of the substrate-treatment system in a substrate transport plane within a vacuum chamber past a treatment device, solves the problem of dynamically shaping a dynamic change of the thermal insulation to control the heat transfer in the substrate and thereby, reduce, in particular, thermal inertias by providing a heat-absorbing cooler side of the substrate transport plane. The heat-absorbing cooler can be shielded, at least partially from the substrate transport plane, using an insulation member.

Abstract: Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.

Abstract: In a vacuum coating installation to coat planar substrates, comprising a vacuum chamber and a transport device arranged in the vacuum chamber for transporting the substrates along a transportation path through the vacuum chamber, with the transport device comprising a multitude of transport rollers arranged successively along the transportation path, each transport roller is adapted to be mounted at least at two different positions, vertically distanced from each other. A carrier frame has a substrate accepting structure and a guiding rod arranged at the bottom of the carrier frame in the direction of transportation to create a friction connection with the transportation device, connected to the carrier frame at the connection points, with the guiding rod being connected at least at one connection point to the carrier frame such that a relative displacement is possible of the guiding rod relative to the carrier frame in the direction of transportation.

Abstract: A method is provided for producing a processing atmosphere for coating substrates, with this method primarily being used in CVD-processes for precipitating an individual layer or a system of individual layers under defined processing atmospheres, in which processing gas is supplied to a coating chamber in a defined manner and exhausted. Via the method and related devices, a variable processing atmosphere is adjustable inside the coating chamber in a flexible, reliable and homogenous manner, and requiring a reduced maintenance and energy expense, even when the substrate is heated. The processing gas is created by at least one gas channel extending perpendicular in reference to the substrate by way of supplying gas flow or exhausting, with a lateral extension being equivalent to the width of the substrate.

Abstract: In a vacuum coating installation to coat planar substrates, comprising a vacuum chamber and a transport device arranged in the vacuum chamber for transporting the substrates along a transportation path through the vacuum chamber, with the transport device comprising a multitude of transport rollers arranged successively along the transportation path, each transport roller is adapted to be mounted at least at two different positions, vertically distanced from each other. A carrier frame has a substrate accepting structure and a guiding rod arranged at the bottom of the carrier frame in the direction of transportation to create a friction connection with the transportation device, connected to the carrier frame at the connection points, with the guiding rod being connected at least at one connection point to the carrier frame such that a relative displacement is possible of the guiding rod relative to the carrier frame in the direction of transportation.

Abstract: A method is provided for producing a processing atmosphere for coating substrates, with this method primarily being used in CVD-processes for precipitating an individual layer or a system of individual layers under defined processing atmospheres, in which processing gas is supplied to a coating chamber in a defined manner and exhausted. Via the method and related devices, a variable processing atmosphere is adjustable inside the coating chamber in a flexible, reliable and homogenous manner, and requiring a reduced maintenance and energy expense, even when the substrate is heated. The processing gas is created by at least one gas channel extending perpendicular in reference to the substrate by way of supplying gas flow or exhausting, with a lateral extension being equivalent to the width of the substrate.

Abstract: Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.