Abstract: A method of calibrating a topography metrology instrument using a calibration reference, which includes a substrate and a plurality of bi-layer stacks. Each bi-layer stack includes a plurality of bi-layer steps. At least one bi-layer step of the plurality of bi-layer steps includes two materials. The at least one bi-layer step of the plurality of bi-layer steps includes an etch stop layer and a bulk layer. The calibration reference includes a calibration reference step profile includes a plurality of predetermined bi-layer stack heights. The calibration reference step profile and the predetermined bi-layer stack heights are measured using a topography metrology instrument. The topography metrology instrument is calibrated based on the measured calibration reference step profile and the measured bi-layer stack heights.

Abstract: A method of optical spectroscopy and a device for use in optical spectroscopy. The device includes a substrate, and a plurality of etalon cavities affixed to or coupled to the substrate. A signal is received from a Fabry-Perot interferometer. The signal is sampled using the device according to a generalized Nyquist-Shannon sampling criterion. The signal is sampled using the device according to a phase differential criterion for wave number resolution. An input spectrum for the signal is reconstructed based on the signal sampled according to the generalized Nyquist-Shannon sampling criterion and the signal sampled according to the phase differential criterion for wave number resolution.

Abstract: A method of optical spectroscopy and a device for use in optical spectroscopy. The device includes a substrate, and a plurality of etalon cavities affixed to or coupled to the substrate. A signal is received from a Fabry-Perot interferometer. The signal is sampled using the device according to a generalized Nyquist-Shannon sampling criterion. The signal is sampled using the device according to a phase differential criterion for wave number resolution. An input spectrum for the signal is reconstructed based on the signal sampled according to the generalized Nyquist-Shannon sampling criterion and the signal sampled according to the phase differential criterion for wave number resolution.

Abstract: A method of optical spectroscopy and a device for use in optical spectroscopy. The device includes a substrate, and a plurality of etalon cavities affixed to or coupled to the substrate. A signal is received from a Fabry-Perot interferometer. The signal is sampled using the device according to a generalized Nyquist-Shannon sampling criterion. The signal is sampled using the device according to a phase differential criterion for wave number resolution. An input spectrum for the signal is reconstructed based on the signal sampled according to the generalized Nyquist-Shannon sampling criterion and the signal sampled according to the phase differential criterion for wave number resolution.

Abstract: A method of calibrating a topography metrology instrument using a calibration reference, which includes a substrate and a plurality of bi-layer stacks. Each bi-layer stack includes a plurality of bi-layer steps. At least one bi-layer step of the plurality of bi-layer steps includes two materials. The at least one bi-layer step of the plurality of bi-layer steps includes an etch stop layer and a bulk layer. The calibration reference includes a calibration reference step profile includes a plurality of predetermined bi-layer stack heights. The calibration reference step profile and the predetermined bi-layer stack heights are measured using a topography metrology instrument. The topography metrology instrument is calibrated based on the measured calibration reference step profile and the measured bi-layer stack heights.

Abstract: A method of optical spectroscopy and a device for use in optical spectroscopy. The device includes a substrate, and a plurality of etalon cavities affixed to or coupled to the substrate. A signal is received from a Fabry-Perot interferometer. The signal is sampled using the device according to a generalized Nyquist-Shannon sampling criterion. The signal is sampled using the device according to a phase differential criterion for wave number resolution. An input spectrum for the signal is reconstructed based on the signal sampled according to the generalized Nyquist-Shannon sampling criterion and the signal sampled according to the phase differential criterion for wave number resolution.

Abstract: A ramped etalon cavity structure and a method of fabricating same. A bi-layer stack is deposited on a substrate. The bi-layer stack includes a plurality of bi-layers. Each bi-layer of the plurality of bi-layers includes an etch stop layer and a bulk layer. A three dimensional photoresist structure is formed by using gray-tone lithography. The three dimensional photoresist is plasma etched into the bi-layer stack, thereby generating an etched bi-layer stack. The etched bi-layer stack is chemically etched with a first chemical etchant to generate a multiple-step structure on the substrate, wherein the first chemical etchant stops at the etch stop layer.

Abstract: A ramped etalon cavity structure and a method of fabricating same. A bi-layer stack is deposited on a substrate. The bi-layer stack includes a plurality of bi-layers. Each bi-layer of the plurality of bi-layers includes an etch stop layer and a bulk layer. A three dimensional photoresist structure is formed by using gray-tone lithography. The three dimensional photoresist is plasma etched into the bi-layer stack, thereby generating an etched bi-layer stack. The etched bi-layer stack is chemically etched with a first chemical etchant to generate a multiple-step structure on the substrate, wherein the first chemical etchant stops at the etch stop layer.