Patents by Inventor Andrew John Harpham
Andrew John Harpham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190094715Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: November 28, 2018Publication date: March 28, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
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Patent number: 10168624Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: December 28, 2017Date of Patent: January 1, 2019Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20180120715Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: December 28, 2017Publication date: May 3, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
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Patent number: 9857699Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: November 28, 2016Date of Patent: January 2, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20170075233Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: November 28, 2016Publication date: March 16, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
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Patent number: 9507270Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: August 26, 2014Date of Patent: November 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20140362358Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: August 26, 2014Publication date: December 11, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
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Patent number: 8830440Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: July 20, 2011Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Patent number: 8164734Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: December 19, 2008Date of Patent: April 24, 2012Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20110273681Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: July 20, 2011Publication date: November 10, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
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Publication number: 20090201471Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: December 19, 2008Publication date: August 13, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
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Patent number: 7481867Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: June 16, 2004Date of Patent: January 27, 2009Assignee: Edwards LimitedInventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Patent number: 7368000Abstract: A method is described for recovering a noble gas, such as xenon or krypton, from a first gas mixture comprising a plurality of components, one of which is the noble gas and the others are typically helium and/or nitrogen, argon, and relatively light fluorocarbons. The gas mixture is first conveyed to a gas chromatography column for separating the noble gas from the other components of the gas mixture. As the noble gas travels relatively slowly through the column, the other components are exhausted from the column before the relatively slow noble gas. Following the exhaust of these other components, a purge gas is supplied to the column to flush the noble gas therefrom. A second gas mixture comprising the noble gas and the purge gas is conveyed from the column to a membrane separator to separate the second gas mixture into a noble gas-rich gas stream and a purge gas-rich gas stream, which may be recirculated back to the column for re-use.Type: GrantFiled: December 22, 2004Date of Patent: May 6, 2008Assignee: The BOC Group plcInventors: Ravi Jain, Julian Richard Dean, Robert Bruce Grant, Naum Perelman, Paul Alan Stockman, Neil Condon, Andrew John Harpham, William R. Gerristead, Jr.
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Publication number: 20060130649Abstract: A method is described for recovering a noble gas, such as xenon or krypton, from a first gas mixture comprising a plurality of components, one of which is the noble gas and the others are typically helium and/or nitrogen, argon, and relatively light fluorocarbons. The gas mixture is first conveyed to a gas chromatography column for separating the noble gas from the other components of the gas mixture. As the noble gas travels relatively slowly through the column, the other components are exhaust from the column before the relatively slow noble gas. Following the exhaust of these other components, a purge gas is supplied to the column to flush the noble gas therefrom. A second gas mixture comprising the noble gas and the purge gas is conveyed from the column to a membrane separator to separate the second gas mixture into a noble gas-rich gas stream and a purge gas-rich gas stream, which may be recirculated back to the column for re-use.Type: ApplicationFiled: December 22, 2004Publication date: June 22, 2006Inventors: Ravi Jain, Julian Richard Dean, Robert Bruce Grant, Naum Perelman, Paul Alan Stockman, Neil Condon, Andrew John Harpham