Patents by Inventor Andrew M. Minor

Andrew M. Minor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8580130
    Abstract: Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.
    Type: Grant
    Filed: December 16, 2008
    Date of Patent: November 12, 2013
    Assignee: The Regents of the University of California
    Inventors: Samuel S. Mao, Costas P. Grigoropoulos, David J. Hwang, Andrew M. Minor
  • Patent number: 7960037
    Abstract: A thin film device and compound having an anode, a cathode, and at least one light emitting layer between the anode and cathode, the at least one light emitting layer having at least one carbon nanotube and a conductive polymer.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: June 14, 2011
    Assignee: The Regents of the University of California
    Inventors: Gao Liu, Stephen Johnson, John B. Kerr, Andrew M. Minor, Samuel S. Mao
  • Publication number: 20100320171
    Abstract: Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.
    Type: Application
    Filed: December 16, 2008
    Publication date: December 23, 2010
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Samuel S. Mao, Costas P. Grigoropoulos, David Hwang, Andrew M. Minor