Abstract: A diamond lens (3) configured for use in a multispectral imaging system (1). The diamond lens (3) has a largest linear dimension of at least 10 mm and is formed from diamond material having a birefringence An of greater than 1×10?4, measured over a specified area of at least 4 mm by 4 mm through a maximum thickness of at least 400 ?m. A multispectral imaging system (1) comprising the diamond lens (3) and a component (2) comprising the diamond lens are also described.

Abstract: A method of fabricating a plurality of single crystal CVD diamonds. The method includes mounting a plurality of single crystal diamond substrates on a first carrier substrate. The plurality of single crystal diamond substrates is subjected to a first CVD diamond growth process to form a plurality of single crystal CVD diamonds on the plurality of single crystal diamond substrates. The plurality of single crystal CVD diamonds are mounted in a recessed carrier substrate and subjected to a second CVD diamond growth process.

Abstract: A poly crystalline chemical vapour deposited (CVD) diamond wafer comprising: —a diameter >40 mm; —a thickness >1.0 mm; —an absorption coefficient ?0.1 cm?1 at 10.6 ?m; and ?a micro feature density, especially in the form of “black spots”, meeting the following specification: —in a central area of the polycrystalline CVD diamond wafer from 0 to 20 mm radius there are no more than 100 micro features of a size between 0.002 and 0.008 mm2, no more than 50 micro features of a size between 0.008 and 0.018 mm2, no more than 25 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2, and ?in an outer region of the polycrystalline CVD diamond wafer from 20 to 40 mm radius there are no more than 200 microfeatures 2 of a size between 0.002 and 0.008 mm2, no more than 150 microfeatures of a size between 0.008 and 0.018 mm2, no more than 100 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2.

Abstract: A method of fabricating a plurality of single crystal CVD diamonds. The method includes mounting a plurality of single crystal diamond substrates on a first carrier substrate. The plurality of single crystal diamond substrates is subjected to a first CVD diamond growth process to form a plurality of single crystal CVD diamonds on the plurality of single crystal diamond substrates. The plurality of single crystal CVD diamonds are mounted in a recessed carrier substrate and subjected to a second CVD diamond growth process.

Abstract: The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials.

Abstract: The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials.

Abstract: The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials.

Abstract: A method of fabricating plates of super-hard material and cutting techniques suitable for such a method. A method of fabricating a plate (14) of super-hard material, the method comprising: •providing a substrate (4) have a lateral dimension of at least 40 mm; •growing a layer of super-hard material on the substrate (4) using a chemical vapor deposition process; and •slicing one or more plates (14) of super-hard material from the substrate using a collimated cutting beam (8), the or each plate of super-hard material (14) having a lateral dimension of at least 40 mm, wherein the collimated cutting beam (8) is collimated with a half angle divergence of no more than 5 degrees.

Abstract: A poly crystalline chemical vapour deposited (CVD) diamond wafer comprising: —a diameter >40 mm; —a thickness >1.0 mm; —an absorption coefficient ?0.1 cm?1 at 10.6 ?m; and ?a micro feature density, especially in the form of “black spots”, meeting the following specification: —in a central area of the polycrystalline CVD diamond wafer from 0 to 20 mm radius there are no more than 100 micro features of a size between 0.002 and 0.008 mm2, no more than 50 micro features of a size between 0.008 and 0.018 mm2, no more than 25 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2, and ?in an outer region of the polycrystalline CVD diamond wafer from 20 to 40 mm radius there are no more than 200 microfeatures 2 of a size between 0.002 and 0.008 mm2, no more than 150 microfeatures of a size between 0.008 and 0.018 mm2, no more than 100 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2.

Abstract: An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: A method of fabricating plates of super-hard material and cutting techniques suitable for such a method. A method of fabricating a plate (14) of super-hard material, the method comprising: • providing a substrate (4) have a lateral dimension of at least 40 mm; • growing a layer of super-hard material on the substrate (4) using a chemical vapour deposition process; and • slicing one or more plates (14) of super-hard material from the substrate using a collimated cutting beam (8), the or each plate of super-hard material (14) having a lateral dimension of at least 40 mm, wherein the collimated cutting beam (8) is collimated with a half angle divergence of no more than 5 degrees.

Abstract: An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials.