Patents by Inventor Andrew N. Nguyen

Andrew N. Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120199071
    Abstract: Embodiments described herein relate to a plasma chamber and processing system utilizing robust components. In one embodiment, a chamber is provided. The chamber includes a body having an interior volume, a gas distribution assembly disposed in the interior volume opposing a substrate support, the gas distribution assembly having a coolant channel disposed thereon, and a first hollow conduit and a second hollow conduit coupled to the body and in fluid communication with the interior volume.
    Type: Application
    Filed: April 13, 2012
    Publication date: August 9, 2012
    Applicant: Applied Materials, Inc.
    Inventors: KENNETH S. COLLINS, Andrew N. Nguyen, Kartik Ramaswamy, Hiroji Hanawa, Douglas A. Buchberger, JR., Daniel J. Hoffman, Amir Al-Bayati
  • Publication number: 20080173237
    Abstract: Embodiments described herein generally provide a toroidal plasma source, a plasma channeling device, a showerhead, and a substrate support assembly for use in a plasma chamber. The toroidal plasma source, plasma channeling device, showerhead, and substrate support assembly are adapted to improve the usable lifetime of the plasma chamber, as well as reduce assembly cost, increase the plasma chamber reliability, and improve device yield on the processed substrates.
    Type: Application
    Filed: January 18, 2008
    Publication date: July 24, 2008
    Inventors: Kenneth S. Collins, Andrew N. Nguyen, Kartik Ramaswamy, Hiroji Hanawa, Douglas A. Buchberger, Daniel J. Hoffman, Amir Al-Bayati