Patents by Inventor Andrey E. Yakshin
Andrey E. Yakshin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10916356Abstract: For a working wavelength in the range from 1 nm to 12 nm, a reflective optical element has, on a substrate, a multilayer system that includes at least two alternating materials having a different real part of the refractive index at the working wavelength. The multilayer system includes a first alternating material from the group formed from thorium, uranium, barium, nitrides thereof, carbides thereof, borides thereof, lanthanum carbide, lanthanum nitride, lanthanum boride, and a second alternating material from the group formed from carbon, boron, boron carbide, or lanthanum as first alternating material and carbon or boron as second alternating material. It has, on the side of the multilayer system remote from the substrate, a protective layer system including a nitride, an oxide and/or a platinum metal.Type: GrantFiled: July 15, 2019Date of Patent: February 9, 2021Assignee: Carl Zeiss SMT GmbHInventors: Dmitry Kuznetsov, Andrey E. Yakshin, Hartmut Enkisch, Viacheslav Medvedev, Frederik Bijkerk
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Publication number: 20200027623Abstract: For a working wavelength in the range from 1 nm to 12 nm, a reflective optical element has, on a substrate, a multilayer system that includes at least two alternating materials having a different real part of the refractive index at the working wavelength. The multilayer system includes a first alternating material from the group formed from thorium, uranium, barium, nitrides thereof, carbides thereof, borides thereof, lanthanum carbide, lanthanum nitride, lanthanum boride, and a second alternating material from the group formed from carbon, boron, boron carbide, or lanthanum as first alternating material and carbon or boron as second alternating material. It has, on the side of the multilayer system remote from the substrate, a protective layer system including a nitride, an oxide and/or a platinum metal.Type: ApplicationFiled: July 15, 2019Publication date: January 23, 2020Inventors: Dmitry Kuznetsov, Andrey E. Yakshin, Hartmut Enkisch, Viacheslav Medvedev, Frederik Bijkerk
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Publication number: 20160116648Abstract: An optical element (50), comprising: a substrate (52), and a multilayer coating (51) applied to the substrate (52), including: at least one first layer system (53) consisting of an arrangement of identically constructed stacks (X1 to X4) each having at least two layers (53a-d), and at least one second layer system (54) consisting of an arrangement of identically constructed stacks (Y1, Y2) each having at least two layers (54a, 54b), wherein, upon a thermal loading of the multilayer coating (51), the first layer system (53) is configured to experience an irreversible contraction of the thicknesses (dX) of the stacks (X1 to X4) and the second layer system (54) is configured to experience an irreversible expansion of the thicknesses (dY) of the stacks (Y1, Y2).Type: ApplicationFiled: October 29, 2015Publication date: April 28, 2016Inventors: Robbert W. E. VAN DE KRUIJS, Steven NYABERO, Andrey E. YAKSHIN, Frederik BIJKERK
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Patent number: 8475635Abstract: Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.Type: GrantFiled: August 24, 2011Date of Patent: July 2, 2013Assignee: Carl Zeiss SMT GmbHInventors: Andrey E. Yakshin, Wolfgang Fukarek
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Patent number: 8144830Abstract: A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).Type: GrantFiled: August 5, 2009Date of Patent: March 27, 2012Assignee: Carl Zeiss GmbHInventors: Andrey E. Yakshin, Robbert W. E. Van De Kruijs, Fred Bijkerk, Eric Louis, Ileana Nedelcu
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Publication number: 20110303529Abstract: Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.Type: ApplicationFiled: August 24, 2011Publication date: December 15, 2011Applicant: CARL ZEISS SMT GMBHInventors: Andrey E. YAKSHIN, Wolfgang FUKAREK
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Patent number: 8025777Abstract: It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.Type: GrantFiled: March 6, 2009Date of Patent: September 27, 2011Assignee: Carl Zeiss SMT GmbHInventors: Andrey E. Yakshin, Wolfgang Fukarek
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Publication number: 20100027107Abstract: A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).Type: ApplicationFiled: August 5, 2009Publication date: February 4, 2010Applicant: Carl Zeiss SMT AGInventors: Andrey E. Yakshin, Robbert W. E. Van De Kruijs, Fred Bijkerk, Eric Louis, Ileana Nedelcu
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Publication number: 20090223812Abstract: It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.Type: ApplicationFiled: March 6, 2009Publication date: September 10, 2009Applicant: CARL ZEISS SMT AGInventors: Andrey E. YAKSHIN, Wolfgang Fukarek
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Patent number: 7261957Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.Type: GrantFiled: November 12, 2003Date of Patent: August 28, 2007Assignee: Carl Zeiss SMT AGInventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cornelis Görts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs
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Patent number: 7172788Abstract: In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.Type: GrantFiled: October 2, 2002Date of Patent: February 6, 2007Assignee: Carl Zeiss SMT AGInventors: Andrey E. Yakshin, Eric Louis, Frederik Bijkerk, Marco Wedowski, Roman Klein, Frank Stietz
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Publication number: 20040245090Abstract: The invention relates to a process for manufacturing multilayer systems for mirrors in the extreme ultraviolet and x-ray wavelength range, whereby at least one layer, in particular made of Mo, Si, Ru, C., B, Rb, Sr, Y, Cr, Sc or components thereof, is at least partly deposited with ion-beam assistance. In order to improve the surface properties of multilayer systems and to achieve the highest possible reflectivity the ion energy of the ion-beam is selected as an energy equivalent to or below the layer's sputtering threshold.Type: ApplicationFiled: April 22, 2004Publication date: December 9, 2004Inventors: Andrey E. Yakshin, Frederik Bijkerk, T.P.C. Klaver, Eric Louis
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Publication number: 20040121134Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.Type: ApplicationFiled: November 12, 2003Publication date: June 24, 2004Inventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cormelis Gorts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Ir. Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs
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Publication number: 20040052942Abstract: When coating substrates it is frequently desired that the layer thickness should be a certain function of the position on the substrate to be coated. To control the layer thickness a mask is conventionally arranged between the coating particle source and the substrate. This leads to undesirable shadow effects. In addition, is has so far only been possible to obtain rotationally symmetrical thickness distributions. It is now proposed that masks should be used having apertures aligned according to a regular grid on the mask surface. Such a mask with a mask holder comprising a base frame (2), an intermediate frame (3) and a mask frame (4) which are joined one to the other by means of double hinges (5a, a′, b, b′), is moved arbitrarily in the mask plane. By this means arbitrary thickness distributions can be achieved when coating substrates at reasonable cost.Type: ApplicationFiled: October 6, 2003Publication date: March 18, 2004Inventors: Frederik Bijkerk, Andrey E Yakshin, Eric Louis, Marcus Jozef Henricus Kessels, Edward Lambertus Gerardus Maas, Caspar Bruineman
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Patent number: 6656575Abstract: Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. The multilayer systems according to the invention have protective layers made from ruthenium, aluminium oxide, silicon carbide, molybdenum carbide, carbon, titanium nitride or titanium dioxide. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the protective layer or, except in the case of ruthenium, by mixing aluminium or titanium with oxygen or nitrogen at atomic level, with ion-beam support, to product an outermost protective layer with ion-beam support.Type: GrantFiled: March 29, 2001Date of Patent: December 2, 2003Assignee: Carl-Zeiss-StiftungInventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cornelis Görts, Sebastian Oestreich
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Patent number: 6483597Abstract: A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured. The method includes the following steps: Calculation of a reflectivity-time curve of the multi-layer system to be produced Determination of points in time ti (i=1, 2, . . . , N), at which the deposition of the i-th layer is to be stopped; and if need be determination of points in time ti′ (i=1, 2, . . .Type: GrantFiled: April 17, 2001Date of Patent: November 19, 2002Assignee: Carl-Zeiss-StiftungInventors: Andrey E. Yakshin, Eric Louis, Frederik Bijkerk
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Publication number: 20020012797Abstract: 1. Multilayer system and its production.Type: ApplicationFiled: March 29, 2001Publication date: January 31, 2002Inventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cornelis Gorts, Sebastian Oestreich
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Publication number: 20010038456Abstract: A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured.Type: ApplicationFiled: April 17, 2001Publication date: November 8, 2001Inventors: Andrey E. Yakshin, Eric Louis, Frederik Bijkerk