Abstract: Devices, systems, and methods within the present disclosure can assist in predicting material structural information based on functional characterization. Such predictions can be achieved by definition including a representation of a surface of a material as an ensemble of unit cells, determination of a pool of possible unit cells based on one or more material input properties, and computation of functional characteristics of the unit cells within the pool; and establishment including determination of a combination of unit cells from the pool to represent a potential surface structure of the material and computation of a corresponding cumulative functional characteristic for the material from the previously computed functional characteristics of individual unit cells of the combination, and validation of whether the computed cumulative functional characteristic matches at least one experimental measurement of the same functional property concerning the material. Iteration can assist.

Abstract: Devices, systems, and methods for material characterization can include detecting definitional data from material samples that are positionally encoded according to know attributes as operational data, characterizing at least some of the samples as training data, and processing the training data via a machine learning model to train the model and/or to characterize the remaining samples based on the training data.

Abstract: Cantilever-Free Scanning Probe Lithography (CF-SPL) techniques are used to enable generation of 1-, 2-, 3-, and 4-D information containing patterns in a mask-free manner that, in turn, enables instantaneous change of pattern design.

Abstract: Disclosed embodiments provide an electrical contact alignment strategy for leveling an array of probes, pens, tips, etc., in relationship to a substrate, for example, wherein a plurality of independent electrical circuits are formed by configuring regions of the array and substrate regions to be partially conductive and connected to opposite electrodes or vice versa.

Abstract: Cantilever-Free Scanning Probe Lithography (CF-SPL) techniques are used to enable generation of 1-, 2-, 3-, and 4-D information containing patterns in a mask-free manner that, in turn, enables instantaneous change of pattern design.

Abstract: Described herein are systems for analysis of biopolymers and complexes containing biopolymers based on optical measurement of ion flux through pores. Also described are methods of using such devices for analysis of biopolymers and complexes containing biopolymers, including methods of determining the nucleotide sequences of polynucleotides.

Abstract: Disclosed embodiments provide an electrical contact alignment strategy for leveling an array of probes, pens, tips, etc., in relationship to a substrate, for example, wherein a plurality of independent electrical circuits are formed by configuring regions of the array and substrate regions to be partially conductive and connected to opposite electrodes or vice versa.