Patents by Inventor Andrey Mikhailovich Yakunin

Andrey Mikhailovich Yakunin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Spectral purity filters for use in a lithographic apparatus
    Patent number: 9041912
    Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: May 26, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Andrey Mikhailovich Yakunin, Martin Jacobus Johan Jak
  • Spectral purity filters for use in a lithographic apparatus
    Patent number: 8390788
    Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.
    Type: Grant
    Filed: July 9, 2009
    Date of Patent: March 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Andrey Mikhailovich Yakunin, Martin Jacobus Johan Jak
  • Spectral Purity Filters for Use in a Lithographic Apparatus
    Publication number: 20130010363
    Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Andrey Mikhailovich Yakunin, Martin Jacobus Johan Jak
  • SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS
    Publication number: 20110044425
    Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martin Jacobus Johan Jak, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Andrey Mikhailovich Yakunin
  • Spectral Purity Filters for Use in a Lithographic Apparatus
    Publication number: 20100020304
    Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.
    Type: Application
    Filed: July 9, 2009
    Publication date: January 28, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Andrey Mikhailovich Yakunin, Martin Jacobus Johan Jak