Patents by Inventor Andrey S. Tychkov

Andrey S. Tychkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7834980
    Abstract: A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: November 16, 2010
    Assignee: ASML Netherlands B. V.
    Inventors: Johannes Jacobus Matheus Baselmans, Andrey S. Tychkov
  • Publication number: 20080151206
    Abstract: A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 26, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Andrey S. Tychkov