Patents by Inventor Andrey Sergeevich TYCHKOV

Andrey Sergeevich TYCHKOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LASER FOCUSSING MODULE
    Publication number: 20220206397
    Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).
    Type: Application
    Filed: April 3, 2020
    Publication date: June 30, 2022
    Applicants: ASML Netherlands B.V., Trumpf Lasersystems For Semiconductor Manufacturing GmbH
    Inventors: Ruud Antonius Catharina Maria BEERENS, Nico Johannes Antonius BOONEN, Stefan Michael Bruno BÄUMER, Tolga Mehmet ERGIN, Andreas Kristian HOPF, Derk Jan Wilfred KLUNDER, Martin Anton LAMBERT, Stefan PIEHLER, Manisha RANJAN, Frank Bernhard SPERLING, Andrey Sergeevich TYCHKOV, Jasper WITTE, Jiayue YUAN
  • Reflective optical element for a radiation beam
    Patent number: 11237491
    Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: February 1, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Ramon Mark Hofstra, Andrey Sergeevich Tychkov, Francois Charles Dominique Deneuville, Gerardus Hubertus Petrus Maria Swinkels, Petrus Adrianus Theodorus Maria Ruijs
  • Reflective Optical Element for a Radiation Beam
    Publication number: 20210165336
    Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
    Type: Application
    Filed: April 10, 2019
    Publication date: June 3, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Ramon Mark HOFSTRA, Andrey Sergeevich TYCHKOV, Francois Charles Dominique DENEUVILLE, Gerardus Hubertus Petrus Maria SWINKELS, Petrus Adrianu Theodorus Maria RUIJS
  • EUV source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus
    Patent number: 10295916
    Abstract: Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: May 21, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Heine Melle Mulder, Andrey Sergeevich Tychkov, Willem Van Schaik
  • EUV SOURCE CHAMBER AND GAS FLOW REGIME FOR LITHOGRAPHIC APPARATUS, MULTI-LAYER MIRROR AND LITHOGRAPHIC APPARATUS
    Publication number: 20180246422
    Abstract: Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.
    Type: Application
    Filed: April 24, 2018
    Publication date: August 30, 2018
    Inventors: Heine Melle MULDER, Andrey Sergeevich TYCHKOV, Willem VAN SCHAIK
  • Illumination system, lithographic apparatus and method
    Patent number: 9360762
    Abstract: An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventor: Andrey Sergeevich Tychkov
  • Illumination System, Lithographic Apparatus and Method
    Publication number: 20120194794
    Abstract: An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.
    Type: Application
    Filed: January 30, 2012
    Publication date: August 2, 2012
    Applicant: ASML Netherlands B.V.
    Inventor: Andrey Sergeevich TYCHKOV