Patents by Inventor Andrzej Golanski

Andrzej Golanski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for selective area deposition of thin films on electrically biased substrates
    Patent number: 5910220
    Abstract: An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.
    Type: Grant
    Filed: August 5, 1994
    Date of Patent: June 8, 1999
    Assignee: Martin Marietta Energy Systems, Inc.
    Inventors: Raymond A. Zuhr, Tony E. Haynes, Andrzej Golanski
  • Apparatus and method for selective area deposition of thin films on electrically biased substrates
    Patent number: 5354583
    Abstract: An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.
    Type: Grant
    Filed: November 9, 1992
    Date of Patent: October 11, 1994
    Assignee: Martin Marietta Energy Systems, Inc.
    Inventors: Raymond A. Zuhr, Tony E. Haynes, Andrzej Golanski