Patents by Inventor Angela HECKE

Angela HECKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11975992
    Abstract: The present application discloses a method of producing an aqueous rinsing liquid in an electrochemical cell having an anode chamber with an anode and a cathode chamber with a cathode, the anode chamber and cathode chamber being separated by a cation-selective membrane, wherein the method includes the steps of (a) feeding an aqueous anode chamber feedstock into the anode chamber (b) feeding an aqueous cathode chamber feedstock comprising at least one electrolyte through the cathode chamber; and (c) applying an electrical voltage to the anode and cathode to form rinsing liquid in the cathode chamber; and wherein steps a, b and c are performed, at least in part, simultaneously. Also disclosed is apparatus suitable for carrying out such methods.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: May 7, 2024
    Assignee: LAM RESEARCH AG
    Inventors: Angela Hecke, Hongzhi Wang, Guenther Zerza
  • Patent number: 11345852
    Abstract: The present invention relates to an etchant composition, in particular to an aqueous masking layer etchant composition for use in the removal of tungsten-doped carbon masking layers from a surface of a substrate, such as a semiconductor wafer. The composition comprises (a) 10 to 40 wt. %, based on the total weight of the composition, of hydrogen peroxide; and (b) 0.1 to 2.0 wt. %, based on the total weight of the composition, of one or more corrosion inhibitors.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: May 31, 2022
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Angela Hecke, Hongzhi Wang, David Lou
  • Publication number: 20210277308
    Abstract: The present invention relates to an etchant composition, in particular to an aqueous masking layer etchant composition for use in the removal of tungsten-doped carbon masking layers from a surface of a substrate, such as a semiconductor wafer. The composition comprises (a) 10 to 40 wt. %, based on the total weight of the composition, of hydrogen peroxide; and (b) 0.1 to 2.0 wt. %, based on the total weight of the composition, of one or more corrosion inhibitors.
    Type: Application
    Filed: August 15, 2019
    Publication date: September 9, 2021
    Inventors: Angela HECKE, Hongzhi WANG, David LOU
  • Publication number: 20210017049
    Abstract: The present application discloses a method of producing an aqueous rinsing liquid in an electrochemical cell having an anode chamber with an anode and a cathode chamber with a cathode, the anode chamber and cathode chamber being separated by a cation-selective membrane, wherein the method includes the steps of (a) feeding an aqueous anode chamber feedstock into the anode chamber (b) feeding an aqueous cathode chamber feedstock comprising at least one electrolyte through the cathode chamber; and (c) applying an electrical voltage to the anode and cathode to form rinsing liquid in the cathode chamber; and wherein steps a, b and c are performed, at least in part, simultaneously. Also disclosed is apparatus suitable for carrying out such methods.
    Type: Application
    Filed: March 26, 2019
    Publication date: January 21, 2021
    Inventors: Angela HECKE, Hongzhi WANG, Guenther ZERZA