Abstract: In some embodiments, a three-switch dual output buck converter includes a converter circuit having N+1 switch circuits, the converter circuit being configured to receive an input voltage and to provide N output voltages, where N is two or more, and a control circuit to selectively provide control signals to the N+1 switch circuits at time intervals in accordance with the N output voltages, wherein the N output voltages include at least two different types of outputs. Other embodiments are disclosed and claimed.

Abstract: In some embodiments, a power manager may be coupled to a load circuit and configured to receive an input signal indicating a line disturbance on a power supply line and to reduce a load requirement of the load circuit in accordance with the received signal. The power manager may be configured to selectively reduce power to components with low entrance latency while continuing to provide full power to components with high entrance latency. Other embodiments are disclosed and claimed.

Abstract: In some embodiments, an unregulated isolated DC/DC converter may be configured to receive an input signal and to provide an output signal. A ripple control circuit may be coupled to the unregulated isolated DC/DC converter, wherein the ripple control circuit is configured to reduce an amount of low frequency ripple transferred to the output signal from the input signal. Other embodiments are disclosed and claimed.

Abstract: There is disclosed a dual magnetron sputtering apparatus that is comprised of a balancing circuit connected to the output of an ac power source that supplies ac power to at least two target materials such that the balancing circuit allows the power supply to deliver equal power to each target material. In those applications where there may be an erosion of one target material faster than the other, the balancing circuit allows the power supply to deliberately unbalance the power to at least one of the target materials to reduce power to the target to compensate for faster erosion of the target.

Abstract: There is disclosed a dual magnetron sputtering apparatus that is comprised of a balancing circuit connected to the output of an ac power source that supplies ac power to at least two target materials such that the balancing circuit allows the power supply to deliver equal power to each target material. In those applications where there may be an erosion of one target material faster than the other, the balancing circuit allows the power supply to deliberately unbalance the power to at least one of the target materials to reduce power to the target to compensate for faster erosion of the target.