Abstract: The invention provides methods and equipment for depositing a low-maintenance coating.

Abstract: The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.

Abstract: A glass substrate is provided having a major surface on which there is a coating comprising a transparent conductive oxide film. The TCO film may comprise aluminum-doped zinc aluminum oxide (“AZO”) or tin-doped indium oxide (“ITO”). When the coated glass substrate is heat-treated, the coating exhibits desirable sheet resistance and absorption values. In some cases, the coating comprises a first transparent dielectric film, a second transparent dielectric film, a transparent conductive oxide film comprising AZO or ITO, and a third transparent dielectric film.

Abstract: A coated substrate useful as a transparent electrode for electrical or optical devices is provided. The coated substrate includes a transparent sodium-containing substrate with a protective layer disposed over the transparent sodium-containing substrate. Characteristically, the protective layer has a thickness of at least 400 angstroms and comprises aluminum oxides and silicon oxides. An electrically conductive layer is disposed over the protective layer. In other variations, devices incorporating such coated substrates are provided.

Abstract: A photovoltaic element for photovoltaic applications includes a transparent substrate having a first side and a second side. A transparent electrically conductive oxide is disposed over the first side of the transparent substrate. Similarly, a hydrophilic oxide coating is disposed over and contacts the transparent electrically conductive oxide. Finally, a removable protective coating is disposed over the hydrophilic oxide coating.

Abstract: A glass substrate is provided having a major surface on which there is a coating comprising a transparent conductive oxide film. The TCO film may comprise aluminum-doped zinc aluminum oxide (“AZO”) or tin-doped indium oxide (“ITO”). When the coated glass substrate is heat-treated, the coating exhibits desirable sheet resistance and absorption values. In some cases, the coating comprises a first transparent dielectric film, a second transparent dielectric film, a transparent conductive oxide film comprising AZO or ITO, and a third transparent dielectric film.

Abstract: A sheet-like pane bearing a low-maintenance coating on one surface and a low-emissivity coating on the opposite surface, wherein one of the low-maintenance coating and the low-emissivity coating has a single surface reflectivity of less than 3 times, and more than one-third, that of the other coating.

Abstract: The invention provides niobium-titanium films, coatings (e.g., low-emissivity coatings) comprising one or more niobium-titanium films, and substrates bearings such coatings. Methods of depositing niobium-titanium films are also provided.

Abstract: The invention provides a substrate bearing a photocatalytic coating. In some embodiments, the coating includes a photocatalytic film comprising titania deposited over a layer comprising tungsten oxide, aluminum oxide, niobium oxide or zirconium oxide. Additionally or alternatively, the photocatalytic film can include both titania and a material selected from the group consisting of nitrogen, tantalum, copper and silica. The invention also provides methods of depositing such coatings.

Abstract: The invention provides methods and equipment for depositing a low-maintenance coating.

Abstract: The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.

Abstract: The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes a thickness of film comprising titania, wherein only part of that thickness includes tungsten. The thickness includes an inner portion and an outer portion, the outer portion being the part that includes tungsten. The invention also provides methods and equipment for depositing such coatings.

Abstract: The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.

Abstract: The invention provides a glazing that includes a substrate on which there is provided a coating comprising carbon nanotubes. The glazing can be an IG unit comprising two spaced-apart panes bounding a between-pane space, the IG unit having at least one exterior surface on which there is provided a transparent conductor coating comprising carbon nanotubes. The glazing can alternatively be a laminated glass assembly comprising two panes of glass and an interlayer comprising carbon nanotubes sandwiched therebetween. Monolithic substrate embodiments are also provided. In certain embodiments, the coating comprises both dielectric film and carbon nanotubes.

Abstract: The invention provides a glazing that includes a substrate on which there is provided a coating comprising carbon nanotubes. The glazing can be an IG unit comprising two spaced-apart panes bounding a between-pane space, the IG unit having at least one exterior surface on which there is provided a transparent conductor coating comprising carbon nanotubes. The glazing can alternatively be a laminated glass assembly comprising two panes of glass and an interlayer comprising carbon nanotubes sandwiched therebetween. Monolithic substrate embodiments are also provided. In certain embodiments, the coating comprises both dielectric film and carbon nanotubes.

Abstract: The invention provides a substrate bearing a low-maintenance coating. The coating includes two films: a first film comprising silica (e.g., silicon dioxide) and a second film comprising titania (e.g., titanium dioxide). Preferably, both films are provided within particular thickness ranges. The invention also provides methods of depositing such coatings.

Abstract: A substrate bearing a low-emissivity coating, the coating comprising two infrared-reflective layers separated by a middle coat, the middle coat comprising two zinc tin oxide film regions separated by a tin oxide film region.

Abstract: The invention provides a substrate bearing a low-maintenance coating. The coating includes at least two films: a base film optionally comprising silica (e.g., silicon dioxide) and a film comprising titania (e.g., titanium dioxide). The invention also provides methods of depositing such coatings.

Abstract: The invention provides a substrate bearing a low-maintenance coating. The coating includes two films: a first film comprising silica (e.g., silicon dioxide) and a second film comprising titania (e.g., titanium dioxide). Preferably, both films are provided within particular thickness ranges. The invention also provides methods of depositing such coatings.

Abstract: The invention provides a substrate bearing a low-maintenance coating. The coating includes at least two films: a base film optionally comprising silica (e.g., silicon dioxide) and a film comprising titania (e.g., titanium dioxide). The invention also provides methods of depositing such coatings.