Patents by Inventor Ansley E Dennis

Ansley E Dennis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS FOR FABRICATING ISOLATED MICRO- OR NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
    Publication number: 20230248651
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: April 21, 2023
    Publication date: August 10, 2023
    Applicant: THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL
    Inventors: JOSEPH M. DESIMONE, JASON P. ROLLAND, BENJAMIN W. MAYNOR, LARKEN E. EULISS, GINGER DENISON ROTHROCK, ANSLEY E. DENNIS, EDWARD T. SAMULSKI, R. JUDE SAMULSKI
  • Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
    Patent number: 11642313
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Grant
    Filed: November 11, 2020
    Date of Patent: May 9, 2023
    Assignee: THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • METHODS FOR FABRICATING ISOLATED MICRO- OR NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
    Publication number: 20210059940
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: November 11, 2020
    Publication date: March 4, 2021
    Inventors: JOSEPH M. DESIMONE, JASON P. ROLLAND, BENJAMIN W. MAYNOR, LARKEN E. EULISS, GINGER DENISON ROTHROCK, ANSLEY E. DENNIS, EDWARD T. SAMULSKI, R. JUDE SAMULSKI
  • Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
    Patent number: 10842748
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: November 24, 2020
    Assignee: THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • METHODS FOR FABRICATING ISOLATED MICRO- OR NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
    Publication number: 20200078301
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: November 20, 2019
    Publication date: March 12, 2020
    Inventors: JOSEPH M. DESIMONE, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
    Patent number: 10517824
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: December 31, 2019
    Assignee: THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • METHODS FOR FABRICATING ISOLATED MICRO- OR NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
    Publication number: 20180116959
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: December 19, 2017
    Publication date: May 3, 2018
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
    Patent number: 9877920
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Grant
    Filed: March 16, 2015
    Date of Patent: January 30, 2018
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • METHODS FOR FABRICATING ISOLATED MICRO- OR NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
    Publication number: 20150283079
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: March 16, 2015
    Publication date: October 8, 2015
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
    Patent number: 8992992
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: March 31, 2015
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography
    Patent number: 8420124
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Grant
    Filed: July 6, 2007
    Date of Patent: April 16, 2013
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larkin E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography
    Patent number: 8263129
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: September 11, 2012
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for Fabrication Isolated Micro-and Nano-Structures Using Soft or Imprint Lithography
    Publication number: 20090028910
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
    Type: Application
    Filed: December 20, 2004
    Publication date: January 29, 2009
    Inventors: Joseph M DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R.Jude Samulski