Patents by Inventor Anthonie Kuijper

Anthonie Kuijper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8054445
    Abstract: A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: November 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Christiaan Alexander Hoogendam, Timotheus Franciscus Sengers, Anthonie Kuijper
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20110080567
    Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
    Type: Application
    Filed: September 29, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Kornelis Tijmen HOEKERD, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
  • LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO PHASE FLOW
    Publication number: 20110013159
    Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 20, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Jacob Kramer, Antonius Johannus Van Der Net, Erik Henricus Egidius Catharina Eummelen, Anthonie Kuijper
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20100328634
    Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.
    Type: Application
    Filed: May 12, 2010
    Publication date: December 30, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
  • FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD
    Publication number: 20100208221
    Abstract: A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.
    Type: Application
    Filed: February 16, 2010
    Publication date: August 19, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens
  • LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100045950
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Application
    Filed: August 18, 2009
    Publication date: February 25, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • Immersion Liquid, Exposure Apparatus, and Exposure Process
    Publication number: 20090134488
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Application
    Filed: February 6, 2006
    Publication date: May 28, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070041001
    Abstract: A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.
    Type: Application
    Filed: August 7, 2006
    Publication date: February 22, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Christiaan Hoogendam, Timotheus Sengers, Anthonie Kuijper