Abstract: Provided are methods for making a slurry composition, suitable for use in a chemical-mechanical planarization process. Also provided are compositions made by such methods. The methods comprise combining: (a) abrasive particles; (b) a suspension medium; (c) a peroxygen compound; (d) an etching agent; and (e) an alkyl ammonium hydroxide. The methods and compositions of the present invention are particularly applicable to the semiconductor manufacturing industry.

Abstract: An ultraclean evaporation system which includes a vessel formed of a fluoropolymer inert to hydrogen peroxide and having an impurity level less than the impurity level of samples to be analyzed therein, preferably perfluoroalkoxy (PFA). A radiant heater is spaced from the vessel for uniformly heating the contents of the vessel. A shield, manufactured of aluminum and coated with a fluoropolymer encases the vessel alone or in conjunction with the heater. An inert gas supply is coupled to the vessel with a coupler of fluoropolymer inert to hydrogen peroxide, preferably PFA. An output is provided from the vessel formed of a fluoropolymer inert to hydrogen peroxide, preferably PFA. An orifice is provided which is formed of a fluoropolymer inert to hydrogen peroxide, preferably PFA, for controlling the flow rate of the inert gas supply. The tubing has a length of at least about 3 meters. The vessel has a side wall and a bottom forming a corner and is disposed so that the corner is the lowest region of the vessel.

Abstract: An anhydrous ammonia gas sampler and concentration system (10) and method is disclosed that facilitates the collection and evaporation of large volumes of anhydrous ammonia in a safe, clean environment. The ammonia is collected and frozen in two containers (12, 14) connected in series and immersed in a liquid nitrogen bath (42). The frozen ammonia is evaporated through a very slow evaporation process after the containers are removed from the liquid nitrogen bath. The resultant contaminant concentrate provides the means by which a more accurate calculation of the percentage of contaminants in an ammonia sample may be made.