Patents by Inventor Anthony P. Kitson

Anthony P. Kitson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7060415
    Abstract: The present invention provides a positive-working, thermally imageable element generally comprising a multi-layered imageable coating. The invention provides an imageable element comprising a substrate, an ink-receptive top layer, and an underlayer, the underlayer including a specific copolymer described herein. The copolymer can be a polymer comprising constitutional units derived from: a) a monomer having a cyclic urea group; b) a monomer comprising an N-substituted maleimide; c) a (meth)acrylamide or (meth)acrylate monomer; and d) a (meth)acrylic acid or vinyl benzoic acid monomer. In another embodiment, the copolymer can be a polymer comprising constitutional units derived from: a) a monomer having a cyclic urea group; b) a (meth)acrylic acid or vinyl benzoic acid monomer; c) and a (meth)acrylonitrile monomer. The imageable element may be used to prepare a lithographic printing plate that is resistant to press chemistry and can optionally be baked to increase press runlength.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: June 13, 2006
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Anthony P. Kitson, Kevin B. Ray, Joanne Ray, Mathias Jarek, Celin Savariar-Hauck
  • Patent number: 6858359
    Abstract: Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: February 22, 2005
    Assignee: Kodak Polychrome Graphics, LLP
    Inventors: Anthony P. Kitson, Kevin B. Ray, Eugene L. Sheriff
  • Publication number: 20040067432
    Abstract: Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.
    Type: Application
    Filed: October 4, 2002
    Publication date: April 8, 2004
    Inventors: Anthony P. Kitson, Kevin B. Ray, Eugene L. Sheriff
  • Patent number: 6218083
    Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.
    Type: Grant
    Filed: March 5, 1999
    Date of Patent: April 17, 2001
    Assignee: Kodak Plychrome Graphics, LLC
    Inventors: Christopher D. McCullough, Kevin B. Ray, Alan S. Monk, Stuart Bayes, Anthony P. Kitson