Patents by Inventor Anton Josef Gerard De Vries

Anton Josef Gerard De Vries has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic system and device manufacturing method
    Publication number: 20080239263
    Abstract: A lithographic system is arranged to project a pattern from a patterning device onto a substrate. The patterning device includes a first pattern on a first region of the patterning device and a second pattern on a second region of the patterning device. A filter arrangement selectively reduces transmission through the second region of the patterning device of radiation, so as to reduce the intensity of one or more images of the second pattern caused by a portion of the radiation beam which is indirectly incident on the second region of the patterning device.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 2, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Anton Josef Gerard De Vries