Patents by Inventor Anton Vihervaara

Anton Vihervaara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
    Patent number: 11814715
    Abstract: A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
    Type: Grant
    Filed: August 19, 2022
    Date of Patent: November 14, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: Katja Väyrynen, Timo Hatanpää, Anton Vihervaara, Mikko Ritala, Markku Leskelä
  • Vapor Deposition Processes
    Publication number: 20230063199
    Abstract: The present disclosure relates to methods and apparatuses for depositing transition metal-containing material on a substrate by a cyclic deposition process. The method comprises providing a substrate in a reaction chamber, providing a transition metal precursor into the reaction chamber in a vapor phase; and providing a second precursor into the reaction chamber in a vapor phase to form transition metal-containing material on the substrate. The transition metal precursor according to the disclosure comprises a transition metal halide compound comprising an organic phosphine adduct ligand.
    Type: Application
    Filed: August 26, 2022
    Publication date: March 2, 2023
    Inventors: Timo Hatanpää, Anton Vihervaara, Mikko Ritala
  • CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL
    Publication number: 20220389583
    Abstract: A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
    Type: Application
    Filed: August 19, 2022
    Publication date: December 8, 2022
    Inventors: Katja Väyrynen, Timo Hatanpää, Anton Vihervaara, Mikko Ritala, Markku Leskelä
  • Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
    Patent number: 11492703
    Abstract: A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system tor forming the material are also disclosed.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: November 8, 2022
    Assignee: ASM IP Holding B.V.
    Inventors: Katja Väyrynen, Timo Hatanpää, Anton Vihervaara, Mikko Ritala, Markku Leskelä
  • CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL
    Publication number: 20210317576
    Abstract: A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system tor forming the material are also disclosed.
    Type: Application
    Filed: June 21, 2019
    Publication date: October 14, 2021
    Inventors: Katja Väyrynen, Timo Hatanpää, Anton Vihervaara, Mikko Ritala, Markku Leskelä