Patents by Inventor Antonie Ellert Duisterwinkel

Antonie Ellert Duisterwinkel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for atomic layer deposition
    Patent number: 11549180
    Abstract: Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: January 10, 2023
    Assignee: Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno
    Inventors: Diederik Jan Maas, Bob van Someren, Axel Sebastiaan Lexmond, Carolus Ida Maria Antonius Spee, Antonie Ellert Duisterwinkel, Adrianus Johannes Petrus Maria Vermeer
  • APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION
    Publication number: 20120003396
    Abstract: Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.
    Type: Application
    Filed: August 25, 2009
    Publication date: January 5, 2012
    Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETEN SCHAPPELIJK ONDERZOEK TNO
    Inventors: Diederik Jan Maas, Bob Van Someren, Axel Sebastiaan Lexmond, Carolus Ida Maria Antonlus Spee, Antonie Ellert Duisterwinkel, Adrianus Johannes Petrus Maria Meer
  • Method and device for measuring contamination of a surface of a component of a lithographic apparatus
    Publication number: 20040227102
    Abstract: A measuring device for determining contamination of a surface of a component in an lithographic projection apparatus. The measuring device includes a radiation transmitter for transmitting radiation on at least a part of the surface and a radiation receiver for receiving radiation from the component. A processor is communicatively connected to the receiver, for deriving a property of received radiation and deriving a property of the contamination from the property of received radiation.
    Type: Application
    Filed: February 23, 2004
    Publication date: November 18, 2004
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Ralph Kurt, Michael Cornelis Van Beek, Antonie Ellert Duisterwinkel, Erik Rene Kieft, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn
  • Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
    Patent number: 6724460
    Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: April 20, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
    Publication number: 20030095240
    Abstract: Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.
    Type: Application
    Filed: November 19, 2001
    Publication date: May 22, 2003
    Applicant: ASM LITHOGRAPHY B.V.
    Inventors: Willem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster