Patents by Inventor Antonius Johannes Van De Pas

Antonius Johannes Van De Pas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, contaminant trap, and device manufacturing method
    Patent number: 7612353
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Grant
    Filed: July 6, 2006
    Date of Patent: November 3, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas, Paul Peter Anna Antonius Brom
  • Lithographic apparatus, contaminant trap, and device manufacturing method
    Patent number: 7397056
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Grant
    Filed: July 6, 2005
    Date of Patent: July 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van De Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas