Patents by Inventor Anzhong Chang
Anzhong Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9322097Abstract: Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.Type: GrantFiled: March 18, 2013Date of Patent: April 26, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Steve Aboagye, Paul Brillhart, Surajit Kumar, Anzhong Chang, Satheesh Kuppurao, Mehmet Tugrul Samir, David K. Carlson
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Publication number: 20160068955Abstract: Embodiments provided herein generally relate to an apparatus for gas delivering in a semiconductor process chamber. The apparatus may be a gas distribution plate that has a plurality of through holes and a plurality of blind holes formed therein. Process gases are provided into a processing volume of the semiconductor process chamber through the through holes of the gas distribution plate. The blind holes are utilized to control the temperature of the gas distribution plate using a phase change material.Type: ApplicationFiled: August 10, 2015Publication date: March 10, 2016Inventors: Paul BRILLHART, Anzhong CHANG, Edric TONG, Kin Pong LO, David K. CARLSON, Errol Antonio C. SANCHEZ, Zhiyuan YE, Satheesh KUPPURAO
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Publication number: 20160071749Abstract: Embodiments described herein relate to a dome assembly. The dome assembly includes an upper dome comprising a convex arc central window, and an upper peripheral flange engaging the central window at a circumference of the central window.Type: ApplicationFiled: August 14, 2015Publication date: March 10, 2016Inventors: Shu-Kwan LAU, Mehmet Tugrul SAMIR, Anzhong CHANG
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Publication number: 20160033070Abstract: Embodiments of the disclosure relate to a perimeter pumping member for a processing chamber. The perimeter pumping member comprises a ring-shaped body having a first curved channel along an arc within the ring-shaped body, a first inner channel connecting a first region of the first curved channel to a first region of an inner surface of the ring-shaped body, a plurality of second inner channels connecting a second region of the first curved channel to a second region of the inner surface, and a first outer channel connecting the first region of the first curved channel to an outer surface of the ring-shaped body, wherein the second inner channels are each sized such that, when a fluid is pumped out of the perimeter pumping member via the first outer channel, the fluid flows through the first inner channel and the second inner channels at a uniform flow rate.Type: ApplicationFiled: November 21, 2014Publication date: February 4, 2016Inventors: Paul BRILLHART, Edric TONG, Anzhong CHANG, David K. CARLSON, Errol Antonio C. SANCHEZ, James Francis MACK, Kin Pong LO, Zhiyuan YE
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Publication number: 20150340257Abstract: Embodiments disclosed herein relate to a light pipe structure for thermal processing of semiconductor substrates. In one embodiment, a light pipe window structure for use in a thermal process chamber includes a transparent plate, and a plurality of light pipe structures formed in a transparent material that is coupled to the transparent plate, each of the plurality of light pipe structures comprising a reflective surface and having a longitudinal axis disposed in a substantially perpendicular relation to a plane of the transparent plate.Type: ApplicationFiled: March 12, 2015Publication date: November 26, 2015Inventors: PAUL BRILLHART, Joseph M. Ranish, Aaron Muir Hunter, Edric Tong, James Francis Mack, Kin Pong Lo, Errol Antonio C. Sanchez, Zhiyuan Ye, Anzhong Chang
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Publication number: 20150340266Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.Type: ApplicationFiled: April 28, 2015Publication date: November 26, 2015Inventors: Anhthu NGO, Zuoming ZHU, Balasubramanian RAMACHANDRAN, Paul BRILLHART, Edric TONG, Anzhong CHANG, Kin Pong LO, Kartik SHAH, Schubert S. CHU, Zhepeng CONG, James Francis MACK, Nyi O. MYO, Kevin Joseph BAUTISTA, Xuebin LI, Yi-Chiau HUANG, Zhiyuan YE
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Publication number: 20150233016Abstract: Embodiments provided herein generally relate to an apparatus for delivering gas to a semiconductor processing chamber. An upper quartz dome of an epitaxial semiconductor processing chamber has a plurality of holes formed therein and precursor gases are provided into a processing volume of the chamber through the holes of the upper dome. Gas delivery tubes extend from the holes in the dome to a flange plate where the tubes are coupled to gas delivery lines. The gas delivery apparatus enables gases to be delivered to the processing volume above a substrate through the quartz upper dome.Type: ApplicationFiled: February 3, 2015Publication date: August 20, 2015Inventors: Paul BRILLHART, Anzhong CHANG, Edric TONG, Kin Pong LO, James Francis MACK, Zhiyuan YE, Kartik SHAH, Errol Antonio C. SANCHEZ, David K. CARLSON, Satheesh KUPPURAO, Joseph M. RANISH
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Publication number: 20140376897Abstract: A processing chamber is described. The processing chamber includes a chamber having an interior volume, a light pipe window structure coupled to the chamber, the light pipe window structure having a first transparent plate disposed within the interior volume of the chamber, and a radiant heat source coupled to a second transparent plate of the light pipe window structure in a position outside of the interior volume of the chamber, wherein the light pipe window structure includes a plurality of light pipe structures disposed between the first transparent plate and the second transparent plate.Type: ApplicationFiled: June 5, 2014Publication date: December 25, 2014Inventors: Joseph M. RANISH, Aaron Muir HUNTER, Anzhong CHANG
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Patent number: 8910644Abstract: Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.Type: GrantFiled: March 4, 2011Date of Patent: December 16, 2014Assignee: Applied Materials, Inc.Inventors: Hua Chung, Xizi Dong, Kyawwin Jason Maung, Hiroji Hanawa, Sang Won Kang, David H. Quach, Donald J. K. Olgado, David Bour, Wei-Yung Hsu, Alexander Tam, Anzhong Chang, Sumedh Acharya
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Publication number: 20140261185Abstract: Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.Type: ApplicationFiled: March 18, 2013Publication date: September 18, 2014Applicant: Applied Materials, Inc.Inventors: STEVE ABOAGYE, Paul Brillhart, Surajit Kumar, Anzhong Chang, Satheesh Kuppurao, Mehmet Tugrul Samir, David K. Carlson
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Publication number: 20140199056Abstract: Embodiments of the invention relate to a dome assembly. The dome assembly includes an upper dome comprising a central window, and an upper peripheral flange engaging the central window at a circumference of the central window, wherein a tangent line on an inside surface of the central window that passes through an intersection of the central window and the upper peripheral flange is at an angle of about 8° to about 16° with respect to a planar upper surface of the peripheral flange, a lower dome comprising a lower peripheral flange and a bottom connecting the lower peripheral flange with a central opening, wherein a tangent line on an outside surface of the bottom that passes through an intersection of the bottom and the lower peripheral flange is at an angle of about 8° to about 16° with respect to a planar bottom surface of the lower peripheral flange.Type: ApplicationFiled: December 18, 2013Publication date: July 17, 2014Inventors: Anzhong CHANG, Paul BRILLHART, Surajit KUMAR, Satheesh KUPPURAO, Mehmet Tugrul SAMIR, David K. CARLSON, Steve ABOAGYE, Anh N. NGUYEN, Kailash Kiran PATALAY, Joseph M. RANISH, Oleg SEREBRYANOV, Dongming IU, Shu-Kwan LAU, Zuoming ZHU, Herman DINIZ
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Patent number: 8679956Abstract: A method and apparatus that includes a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume is provided. The showerhead includes one or more cleaning gas conduits configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. The showerhead may include a plurality of metrology ports configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. As a result, the processing chamber components can be cleaned more efficiently and effectively than by introducing cleaning gas into the chamber only through the processing gas channels.Type: GrantFiled: January 28, 2013Date of Patent: March 25, 2014Assignee: Applied Materials, Inc.Inventors: Alexander Tam, Anzhong Chang, Sumedh Acharya
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Publication number: 20130298835Abstract: A method and apparatus that includes a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume is provided. The showerhead includes one or more cleaning gas conduits configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. The showerhead may include a plurality of metrology ports configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. As a result, the processing chamber components can be cleaned more efficiently and effectively than by introducing cleaning gas into the chamber only through the processing gas channels.Type: ApplicationFiled: January 28, 2013Publication date: November 14, 2013Inventors: Alexander TAM, Anzhong CHANG, Sumedh ACHARYA
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Patent number: 8568529Abstract: Embodiments disclosed herein generally relate to an HVPE chamber. The chamber may have two separate precursor sources coupled thereto to permit two separate layers to be deposited. For example, a gallium source and a separate aluminum source may be coupled to the processing chamber to permit gallium nitride and aluminum nitride to be separately deposited onto a substrate in the same processing chamber. The nitrogen may be introduced to the processing chamber at a separate location from the gallium and the aluminum and at a lower temperature. The different temperatures causes the gases to mix together, react and deposit on the substrate with little or no deposition on the chamber walls.Type: GrantFiled: December 14, 2009Date of Patent: October 29, 2013Assignee: Applied Materials, Inc.Inventors: Tetsuya Ishikawa, David H. Quach, Anzhong Chang, Olga Kryliouk, Yuriy Melnik, Harsukhdeep S. Ratia, Son T. Nguyen, Lily Pang
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Patent number: 8491720Abstract: Embodiments disclosed herein generally relate to an HVPE chamber. The chamber may have two separate precursor sources coupled thereto to permit two separate layers to be deposited. For example, a gallium source and a separate aluminum source may be coupled to the processing chamber to permit gallium nitride and aluminum nitride to be separately deposited onto a substrate in the same processing chamber. The nitrogen may be introduced to the processing chamber at a separate location from the gallium and the aluminum and at a lower temperature. The different temperatures causes the gases to mix together, react and deposit on the substrate with little or no deposition on the chamber walls.Type: GrantFiled: December 14, 2009Date of Patent: July 23, 2013Assignee: Applied Materials, Inc.Inventors: Tetsuya Ishikawa, David H. Quach, Anzhong Chang, Olga Kryliouk, Yuriy Melnik, Harsukhdeep S. Ratia, Son T. Nguyen, Lily Pang
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Patent number: 8361892Abstract: A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. In one embodiment, the apparatus a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume. In one embodiment, the showerhead includes one or more cleaning gas conduits configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. In one embodiment, the showerhead includes a plurality of metrology ports configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. As a result, the processing chamber components can be cleaned more efficiently and effectively than by introducing cleaning gas into the chamber only through the processing gas channels.Type: GrantFiled: June 15, 2010Date of Patent: January 29, 2013Assignee: Applied Materials, Inc.Inventors: Alexander Tam, Anzhong Chang, Sumedh Acharya
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Patent number: D664170Type: GrantFiled: March 4, 2011Date of Patent: July 24, 2012Assignee: Applied Materials, Inc.Inventors: Hua Chung, Xizi Dong, Kyawwin Jason Maung, Hiroji Hanawa, Sang Won Kang, David H. Quach, Donald J. K. Olgado, David Bour, Wei-Yung Hsu, Alexander Tam, Anzhong Chang, Sumedh Acharya
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Patent number: D664172Type: GrantFiled: November 16, 2009Date of Patent: July 24, 2012Assignee: Applied Materials, Inc.Inventors: Tetsuya Ishikawa, David H. Quach, Anzhong Chang, Olga Kryliouk, Yuriy Melnik, Harsukhdeep S. Ratia, Son T. Nguyen, Lily Pang
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Patent number: D711331Type: GrantFiled: November 7, 2013Date of Patent: August 19, 2014Assignee: Applied Materials, Inc.Inventors: Shu-Kwan Lau, Mehmet Tugrul Samir, Anzhong Chang, Paul Brillhart, Richard O. Collins
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Patent number: D716240Type: GrantFiled: November 7, 2013Date of Patent: October 28, 2014Assignee: Applied Materials, Inc.Inventors: Shu-Kwan Lau, Mehmet Tugrul Samir, Anzhong Chang, Paul Brillhart, Richard O. Collins