Patents by Inventor Ari Karkkainen
Ari Karkkainen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11634610Abstract: The present invention provides a method for covering a substrate, and includes the following operations: (a) admixing at least four different silane monomers and at least one bi-silane to a first solvent(s) to form a mixture, with the proviso that at least one of the silane monomers or the bi-silane comprises an active group capable of achieving cross-linking to adjacent siloxane polymer chains of the siloxane polymer composition; (b) subjecting the mixture to an acid treatment so that the silane monomers are at least partially hydrolysed, and the hydrolysed silane monomers, the silane monomers and the bi-silane are at least partially polymerized and cross-linked; (c) optionally changing the first solvent to a second solvent; and (d) subjecting the mixture to further cross-linking of the siloxane polymer to achieve a predetermined degree of cross-linking, depositing the siloxane polymer composition on the substrate, and optionally curing the deposited siloxane polymer composition.Type: GrantFiled: September 20, 2021Date of Patent: April 25, 2023Assignee: OPTITUNE OyInventors: Ari Karkkainen, Milja Hannu-Kuure, Admir Hadzic, Jarkko Leivo, Henna Jarvitalo, Rauna-Leena Kuvaja, Graeme Gordon, Matti Pesonen
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Publication number: 20220010172Abstract: The present invention provides a method for covering a substrate, and includes the following operations: (a) admixing at least four different silane monomers and at least one bi-silane to a first solvent(s) to form a mixture, with the proviso that at least one of the silane monomers or the bi-silane comprises an active group capable of achieving cross-linking to adjacent siloxane polymer chains of the siloxane polymer composition; (b) subjecting the mixture to an acid treatment so that the silane monomers are at least partially hydrolysed, and the hydrolysed silane monomers, the silane monomers and the bi-silane are at least partially polymerized and cross-linked; (c) optionally changing the first solvent to a second solvent; and (d) subjecting the mixture to further cross-linking of the siloxane polymer to achieve a predetermined degree of cross-linking, depositing the siloxane polymer composition on the substrate, and optionally curing the deposited siloxane polymer composition.Type: ApplicationFiled: September 20, 2021Publication date: January 13, 2022Applicant: OPTITUNE OyInventors: Ari KARKKAINEN, Milja HANNU-KUURE, Admir HADZIC, Jarkko LEIVO, Henna JARVITALO, Rauna-Leena KUVAJA, Graeme GORDON, Matti PESONEN
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Publication number: 20220010170Abstract: The present invention relates to a process for preparing a thin film on a substrate in which a first precursor composition (FPC) and a second precursor composition (SPC) are combined, a thin layer of the combined first precursor composition (FPC) and second precursor composition (SPC) is formed on a substrate and the thin layer is cured, an article comprising said thin layer, a composition comprising said first precursor composition (FPC) and said second precursor composition (SPC), a kit-of-parts comprising said first precursor composition (FPC) and said second precursor composition (SPC) in two vessels and the use of said composition or kit-of-parts for preparing a thin film on a substrate and for preparing an optical or electrical coating.Type: ApplicationFiled: November 11, 2019Publication date: January 13, 2022Inventors: Mi ZHOU, Neil Gregory PSCHIRER, Hsin Tsao TANG, Ying Jung CHEN, Sami PIRINEN, Ari KARKKAINEN, Milja HANNU-KUURE, Oskari MAEKIMARTTI
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Patent number: 11127864Abstract: A method of producing a photovoltaic cell having a cover, comprising the steps of: providing a photovoltaic cell which comprises a crystalline silicon substrate; providing a transparent substrate; forming an antireflective coating on said transparent substrate to provide a coated transparent substrate; and covering the photovoltaic cell with said coated transparent substrate. The antireflective coating is a hybrid organic-inorganic material having an inorganic portion comprising silicon, oxygen and carbon, and further comprising an organic portion with organic groups connected to the inorganic portion. Methods of producing solar panels, coated glass substrates as well as antireflection coatings are disclosed as well as novel compositions of hybrid organic-inorganic materials.Type: GrantFiled: March 17, 2016Date of Patent: September 21, 2021Assignee: Optitune OyInventors: Ari Kärkkäinen, Milja Hannu-Kuure, Admir Hadzic, Jarkko Leivo, Henna Järvitalo, Rauna-Leena Kuvaja
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Publication number: 20210087429Abstract: A layered structure comprising a substrate layer; and a layer of a siloxane polymer on the substrate layer, the layered structure being capable of being bent about a mandrel having a radius of curvature without breaking. The layer of the siloxane polymer has a thickness of 1 to 50 ?m, in particular about 5 to 20 ?m, and it is obtained by depositing on the substrate a composition comprising at least three different silane monomers, including at least one bi-silane; at least one of the silane monomers having an active group capable of achieving cross-linking to adjacent siloxane polymer; at least partially hydrolyzing the silane monomers to form siloxane polymer chains; and cross-linking the siloxane polymer chains so as to achieve a cross-linked siloxane polymer layer on the substrate.Type: ApplicationFiled: April 8, 2019Publication date: March 25, 2021Inventors: Tiina Leppäjärvi, Milja Hannu-Kuure, Jarkko Leivo, Rauna-Leena Kuvaja, Admir Hadzic, Henna Järvitalo, Graeme Gordon, Ari Kärkkäinen
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Publication number: 20200392368Abstract: The present invention relates to a process for preparing a thin film on a substrate comprising the steps of preparing two precursor compositions comprising metalloid compounds and combining them thereafter whereby one precursor composition is hydrolyzed prior to combination. The present invention is further related to a multilayer structure and an article comprising the thin film obtainable by the process, a composition comprising the precursor compositions, a kit-of-parts comprising the precursor compositions obtainable by the use of the composition and the kit-of-parts for preparing a thin film on a substrate.Type: ApplicationFiled: February 21, 2019Publication date: December 17, 2020Applicant: BASF SEInventors: Admir HADZIC, Ari KARKKAINEN, Sami PIRINEN, Milja HANNU-KUURE, Jarkko LEIVO, Rauna-Leena KUVAJA, Graeme GORDON, Toshikage ASAKURA, Neil Gregory PSCHIRER, Hiroshi YAMAMOTO
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Patent number: 10836675Abstract: A computer or personal communication device or a similar device, comprising a CPU; and a display; wherein the display comprises; an array of optical elements; a touch sensor; and a glass cover having a coating that is oleophobic. The coating of the glass is a polymer having silicon, oxygen and carbon in the backbone. Optionally it may comprise fluorine. The coating has a water contact angle of 65 or more, an oil contact angle of 20 degrees or more, and a pencil hardness of 7H or more. Thus, the coating combines properties of hydro-and oleophobicity and hardness.Type: GrantFiled: March 17, 2016Date of Patent: November 17, 2020Assignee: OPTITUNE OyInventors: Jarkko Leivo, Admir Hadzic, Milja Hannu-Kuure, Ari Karkkainen, Henna Jaervitalo, Rauna-Leena Kuvaja, Matti Pesonen
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Patent number: 10693021Abstract: A method of passivating a silicon substrate for use in a photovoltaic device, comprising providing a silicon substrate having a bulk and exhibiting a front surface and a rear surface, and forming by liquid phase application a dielectric layer on at least said rear surface. The dielectric layer formed at the rear surface is capable of acting as a reflector to enhance reflection of light into the bulk of the silicon substrate, and the dielectric layer is capable of releasing hydrogen into the bulk as well as onto a surface of the silicon substrate in order to provide hydrogenation and passivation. The present invention provides an inexpensive, low cost method of improving the electrical and/or optical performance of photovoltaic devices through the application of coating chemicals onto the backside of the silicon substrate.Type: GrantFiled: September 24, 2013Date of Patent: June 23, 2020Assignee: OPTITUNE OYInventors: Ari Kärkkäinen, Milja Hannu-Kuure, Henna Järvitalo, Paul Williams, Jarkko Leivo, Admir Hadzic, Jianhui Wang
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Patent number: 10690847Abstract: The invention is based on the idea of providing a light emitting diode (OLED) device which contains a substrate with a photonic crystal, whereby the formed film structure induces enhancement of the liberation of photons trapped inside the light emitting device structure. The photonic crystal structure is a film structure on a substrate produced using a combination of high and low refractive index materials, at least one of the materials being based on a liquid phase deposited metal-oxide or metalloid oxide material. By means of the invention light trapped due to total internal reflection in a waveguide acting light emitting structure can be extracted efficiently from the device by introducing the photonic crystal device structure between the substrate and conductive anode layer.Type: GrantFiled: June 15, 2006Date of Patent: June 23, 2020Assignee: BRAGGONE OYInventor: Ari Karkkainen
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Publication number: 20180277691Abstract: A method of producing a photovoltaic cell having a cover, comprising the steps of: providing a photovoltaic cell which comprises a crystalline silicon substrate; providing a transparent substrate; forming an antireflective coating on said transparent substrate to provide a coated transparent substrate; and covering the photovoltaic cell with said coated transparent substrate. The antireflective coating is a hybrid organic-inorganic material having an inorganic portion comprising silicon, oxygen and carbon, and further comprising an organic portion with organic groups connected to the inorganic portion. Methods of producing solar panels, coated glass substrates as well as antireflection coatings are disclosed as well as novel compositions of hybrid organic-inorganic materials.Type: ApplicationFiled: March 17, 2016Publication date: September 27, 2018Inventors: Ari Kärkkäinen, Milja Hannu-Kuure, Admir Hadzic, Jarkko Leivo, Henna Järvitalo, Rauna-Leena Kuvaja
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Publication number: 20180127308Abstract: A computer or personal communication device or a similar device, comprising a CPU; and a display;wherein the display comprises;an array of optical elements;a touch sensor; and a glass cover having a coating that is oleophobic. The coating of the glass is a polymer having silicon, oxygen and carbon in the backbone. Optionally it may comprise fluorine. The coating has a water contact angle of 65 or more, an oil contact angle of 20 degrees or more, and a pencil hardness of 7H or more. Thus, the coating combines properties of hydro-and oleophobicity and hardness.Type: ApplicationFiled: March 17, 2016Publication date: May 10, 2018Applicant: BASF SEInventors: Jarkko LEIVO, Admir HADZIC, Milja HANNU-KUURE, Ari KARKKAINEN, Henna JAERVITALO, Rauna-Leena KUVAJA, Matti PESONEN
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Publication number: 20180066159Abstract: The present invention relates to siloxane polymer compositions. In particular, the invention relates to siloxane polymer compositions which have suitable properties for use in a lithographic fabrication processes. The invention also relates to synthesis, polymerization and cross-linking of such compositions.Type: ApplicationFiled: March 17, 2016Publication date: March 8, 2018Applicant: BASF SEInventors: Ari KARKKAINEN, Milja HANNU-KUURE, Admir HADZIC, Jarkko LEIVO, Henna JARVITALO, Rauna-Leena KUVAJA, Graeme GORDON, Matti PESONEN
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Publication number: 20160252814Abstract: A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane is cross-linked during condensation polymerisation to increase molecular weight thereof. The composition can be used in high-resolution negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.Type: ApplicationFiled: February 25, 2016Publication date: September 1, 2016Inventors: Ari Karkkainen, Milja Hannu-Kuure, Sacha Legrand, Admir Hadzic, Graeme Gordon
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Patent number: 9284455Abstract: An organic-inorganic composition, which has a backbone containing —Si—O— units with chromophore groups attached directly to at least a part of the silicon atoms. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned and a desired Si-content of the anti-reflective coating composition can be obtained—a high Si-content will give good mechanical and thermal properties and also the required wet etch and dry etch properties.Type: GrantFiled: June 13, 2007Date of Patent: March 15, 2016Assignee: Braggone OyInventor: Ari Kärkkäinen
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Patent number: 9273209Abstract: A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane is cross-linked during condensation polymerization to increase molecular weight thereof. The composition can be used in high-resolution negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.Type: GrantFiled: November 28, 2008Date of Patent: March 1, 2016Assignee: Braggone OyInventors: Ari Kärkkäinen, Milja Hannu-Kuure, Sacha Legrand, Admir Hadzic, Graeme Gordon
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Publication number: 20150295196Abstract: A method of producing a photovoltaic device which comprises a solar cell substrate forming the bulk of the device with at least one layer deposited thereon defining a surface of the device, said method comprising the step of introducing a functional layer on the substrate, said layer being capable of releasing hydrogen, and activating said layer to achieve hydrogenation of the photovoltaic device. The method makes it possible, in the case of thick film solar cell production, to have the whole manufacturing sequence performed using chemicals applied under atmospheric conditions.Type: ApplicationFiled: September 24, 2013Publication date: October 15, 2015Inventors: Ari Kärkkäinen, Milja Hannu-Kuure, Henna Järvitalo, Paul Williams, Jarkko Leivo, Admir Hadzic, Jianhui Wang
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Patent number: 9158195Abstract: A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.Type: GrantFiled: May 5, 2014Date of Patent: October 13, 2015Assignee: BRAGGONE OYInventor: Ari Karkkainen
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Publication number: 20150280020Abstract: A method of passivating a silicon substrate for use in a photovoltaic device, comprising providing a silicon substrate having a bulk and exhibiting a front surface and a rear surface, and forming by liquid phase application a dielectric layer on at least said rear surface. The dielectric layer formed at the rear surface is capable of acting as a reflector to enhance reflection of light into the bulk of the silicon substrate, and the dielectric layer is capable of releasing hydrogen into the bulk as well as onto a surface of the silicon substrate in order to provide hydrogenation and passivation. The present invention provides an inexpensive, low cost method of improving the electrical and/or optical performance of photovoltaic devices through the application of coating chemicals onto the backside of the silicon substrate.Type: ApplicationFiled: September 24, 2013Publication date: October 1, 2015Inventors: Ari Kärkkäinen, Milja Hannu-Kuure, Henna Järvitalo, Paul Williams, Jarkko Leivo, Admir Hadzic, Jianhui Wang
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Publication number: 20150255638Abstract: A method of modifying a silicon substrate which is intended for use in a photovoltaic device, comprising the steps of providing an n-type silicon substrate having a bulk and exhibiting a front surface and a rear surface; and forming by liquid phase application dielectric layers on said front and rear surfaces. The dielectric layer formed at the rear surface is capable of acting as a reflector to enhance reflection of light into the bulk of the silicon substrate, and the dielectric layer formed at the front comprises oxygen, hydrogen and at least one metal or semimetal and is capable of releasing hydrogen into the bulk as well as onto the surfaces of the silicon substrate in order to provide hydrogenation and passivation. The present invention provides a low cost method of improving the electrical or optical performance, or both, of photovoltaic devices: an increase in the efficiency of the current extraction and reduction of recombination occur within the device.Type: ApplicationFiled: September 24, 2013Publication date: September 10, 2015Inventors: Ari Kärkkäinen, Milja Hannu-Kuure, Henna Järvitalo, Paul Williams, Jarkko Leivo, Admir Hadzic, Jianhui Wang
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Publication number: 20150249164Abstract: A method of passivating a silicon substrate, comprising providing a silicon substrate having a surface, forming a stack of passivating and anti-reflection coating layers on said surface by liquid phase deposition, wherein the passivating and anti-reflection coating layers comprise hydrogenated silicon oxide layers, and providing at least titanium oxide or tantalum oxide capping layer on the stack opposite to the silicon substrate surface. The procedure offers an alternative to the existing ALD or PECVD methods using SiH4 and other gases, enabling the PV manufacturers to apply chemicals rather than work with hazardous gases to produce a series of layers that provide passivation as well as light absorption.Type: ApplicationFiled: September 24, 2013Publication date: September 3, 2015Inventors: Ari Kärkkäinen, Milja Hannu-Kuure, Henna Järvitalo, Paul Williams, Jarkko Leivo, Admir Hadzic, Jianhui Wang