Abstract: A rotating anode for x-ray generation uses a heat pipe principle with a heat pipe coolant located in a sealed chamber of a rotating portion of the anode. The rotating portion is positioned relative to a second portion so that relative rotation occurs between the two portions and so that a fluid path exists between the two portions through which an external cooling fluid may flow. The relative motion between the two portions provides a turbulent flow to the cooling fluid. The anode may also include cooling fins that extend into the sealed chamber. The sealed chamber may be under vacuum, and may be sealed by o-rings or by brazing. A closable fill port may be provided via which heat pipe coolant may be added. A balancing mass may be used to balance the anode in two dimensions.

Abstract: An X-ray analysis device makes use of a variable aperture for controlling the position and cross section of the X-ray beam. The variable aperture is configured to allow changes in the cross section and/or position of the beam by movement of one aperture component in one direction. In one embodiment, the aperture medium is a perforated disk that is rotated to expose different aperture holes to the beam. In another embodiment, the aperture medium is a perforated tape that is moved in a linear direction to expose different aperture holes to the beam. The tape may be wound about two axes to control its movement, or may be a continuous loop. A cassette may also be used to house the tape.

Abstract: Method and device for the heat treatment of substrates, wherein the substrates are positioned in the vicinity of a heated, essentially flat furnace body extending over the surface of the substrate. In order to provide a reproducible treatment when treating a number of substrates successively, the temperature of the furnace body is measured so close to the surface adjacent to the substrate that the withdrawal of heat from the furnace body by the substrate can be detected. The introduction of each substrate takes place at a point in time when the temperature measured in this way is, within certain limits, equal to a desired initial treatment temperature Ttrig.

Abstract: Method and device for the heat treatment of substrates, wherein the substrates are positioned in the vicinity of a heated, essentially flat furnace body extending over the surface of the substrate. In order to provide a reproducible treatment when treating a number of substrates successively, the temperature of the furnace body is measured so close to the surface adjacent to the substrate that the withdrawal of heat from the furnace body by the substrate can be detected. The introduction of each substrate takes place at a point in time when the temperature measured in this way is, within certain limits, equal to a desired initial treatment temperature Ttrig.

Abstract: Method and device for the heat treatment of substrates, wherein the substrates are positioned in the vicinity of a heated, essentially flat furnace body extending over the surface of the substrate. In order to provide a reproducible treatment when treating a number of substrates successively, the temperature of the furnace body is measured so close to the surface adjacent to the substrate that the withdrawal of heat from the furnace body by the substrate can be detected. The introduction of each substrate takes place at a point in time when the temperature measured in this way is, within certain limits, equal to a desired initial treatment temperature Ttrig.

Abstract: Method and device for the heat treatment of substrates, wherein the substrates are positioned in the vicinity of a heated, essentially flat furnace body extending over the surface of the substrate. In order to provide a reproducible treatment when treating a number of substrates successively, the temperature of the furnace body is measured so close to the surface adjacent to the substrate that the withdrawal of heat from the furnace body by the substrate can be detected. The introduction of each substrate takes place at a point in time when the temperature measured in this way is, within certain limits, equal to a desired initial treatment temperature Ttrig.