Abstract: In a known method for bonding components made of material with a high silicic acid content by means of a substance to substance bond, a SiO2-containing bonding mass is formed between connecting surfaces of the components. In order to provide for cost-efficient manufacture of a thermally stable composite, the invention proposes to generate a SiO2-containing bonding mass that is generic with regard to the material with a high silicic acid content, comprising the following procedural steps: provision of a slurry containing amorphous SiO2 particles; formation of a slurry mass between the connecting surfaces which are fixed in position with regard to each other; drying of the slurry mass; and solidification of the slurry mass by heating under formation of the SiO2-containing bonding mass. A component assembly manufactured according to the method of the invention shows high temperature resistance and thermal fatigue resistance and can also be used in contamination-sensitive applications.

Abstract: In a known component having a reflector layer, the surface of a base body of quartz glass is covered at least in part with a reflector layer. Starting from this, to provide a component, particularly for use in lamp and reflector manufacture, which is equipped with an efficient, chemically and thermally resistant and, nevertheless, inexpensive reflector layer, it is suggested according to the invention that an SiO2 cover layer should be provided which acts as a diffuse reflector and consists of at least partly opaque quartz glass.

Abstract: In a known method for bonding components made of material with a high silicic acid content by means of a substance to substance bond, a SiO2-containing bonding mass is formed between connecting surfaces of the components. In order to provide for cost-efficient manufacture of a thermally stable composite, the invention proposes to generate a SiO2-containing bonding mass that is generic with regard to the material with a high silicic acid content, comprising the following procedural steps: provision of a slurry containing amorphous SiO2 particles; formation of a slurry mass between the connecting surfaces which are fixed in position with regard to each other; drying of the slurry mass; and solidification of the slurry mass by heating under formation of the SiO2-containing bonding mass. A component assembly manufactured according to the method of the invention shows high temperature resistance and thermal fatigue resistance and can also be used in contamination-sensitive applications.

Abstract: In a known component having a reflector layer, the surface of a base body of quartz glass is covered at least in part with a reflector layer. Starting from this, to provide a component, particularly for use in lamp and reflector manufacture, which is equipped with an efficient, chemically and thermally resistant and, nevertheless, inexpensive reflector layer, it is suggested according to the invention that an SiO2 cover layer should be provided which acts as a diffuse reflector and consists of at least partly opaque quartz glass. The method of the invention for producing such a component is characterized in that a slip which contains amorphous SiO2 particles is produced and applied to the surface of the base body with formation of a slip layer, the slip layer is dried and then vitrified with formation of an SiO2 cover layer.

Abstract: A support jig of quartz glass for receiving wafer-like substrates of semiconductor material in a vertical orientation comprises two spaced-apart circular end plates (10) which are interconnected by means of at least three transverse rods (1, 2, 3) extending in parallel with one another and between the end plates. They are provided with slots (4) for receiving the substrates, the slots (4) being open towards the substrate to be received and having a predetermined maximum slot depth, and they are arranged in a partial circle around the circular edge (5) of the end plates (10) such that an envelope (6) which encloses the partial circle on the outside projects nowhere beyond the circular edge (5). At least part of the transverse rods (1, 2, 3) have a radial cross-sectional profile which is configured as a circular form with a flattening (21, 31). The transverse rods (1, 2, 3) are arranged around the partial circle such that the flattening (21, 31) is oriented towards the circular edge of the end plates.