Patents by Inventor Armin W. Knoll

Armin W. Knoll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8715804
    Abstract: The present invention is directed to a method for producing a data storage medium on a surface of a substrate for storing data in the form of topographic features. The method comprises a first step wherein a crosslinking agent containing at least three alkyne groups is deposited on the surface of the substrate. In a second step the deposited cross linking agent is cured so as to obtain the data storage medium in the form of a crosslinked polymeric layer on the surface of the substrate. The invention is further directed to a data storage medium obtained by this method and a data storage device comprising this data storage medium.
    Type: Grant
    Filed: October 15, 2009
    Date of Patent: May 6, 2014
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll, David S. Pires
  • Patent number: 8604135
    Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: December 10, 2013
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lipton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
  • Patent number: 8599673
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Grant
    Filed: January 3, 2012
    Date of Patent: December 3, 2013
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 8592955
    Abstract: The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: November 26, 2013
    Assignee: International Business Machines Corporation
    Inventors: Urs T Duerig, Felix Holzner, Cyrill Kuemin, Armin W. Knoll, Philip Paul, Heiko Wolf
  • Patent number: 8574815
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: November 5, 2013
    Assignee: International Business Machines Corporation
    Inventors: Daniel J. Coady, Urs T. Duerig, Jane E. Frommer, Kazuki Fukushima, James L. Hedrick, Armin W. Knoll
  • Publication number: 20130284598
    Abstract: A method for positioning nano-objects on a surface and an apparatus for implementing the method. The method includes: providing a first surface and a second surface in a position facing each other, where one or more of the surfaces exhibits one or more position structures having dimensions on the nanoscale; providing an ionic liquid suspension of the nano-objects between the two surfaces, where the suspension comprises two electrical double layers each formed at an interface with a respective one of the two surfaces, and the surfaces have electrical charges of the same sign; enabling the nano-objects in the suspension to position according to a potential energy resulting from the electrical charge of the two surfaces; and depositing one or more of the nano-objects on the first surface according to the positioning structures by shifting the minima of the potential energy towards the first surface.
    Type: Application
    Filed: April 26, 2013
    Publication date: October 31, 2013
    Inventors: Urs T. Duerig, Felix Holzner, Armin W. Knoll, Walter H. Riess
  • Publication number: 20130258454
    Abstract: A vertical microcavity having a layer structure perpendicular to a vertical axis z, includes a first reflector and a second reflector, each comprising one or more material layers; a confinement layer between the reflectors, wherein an electromagnetic wave can be substantially confined, the confinement layer having a body and a defect delimited by first and second surfaces, perpendicular to the vertical axis z; wherein one of the two surfaces is contiguous with the body, the other one contiguous with a layer of the first or second reflector, and wherein one of the two surfaces has a curved profile in at least a plane section perpendicular to the layer structure, the curved profile having a vertex, which defines a maximal thickness h0 of the defect between the first surface and the second surface in the plane section, the maximal thickness h0 being less than a thickness of the contiguous layer.
    Type: Application
    Filed: March 11, 2013
    Publication date: October 3, 2013
    Applicant: International Business Machines Corporation
    Inventors: Fei Ding, Armin W. Knoll, Rainer F. Mahrt, Thilo H. Stoeferle
  • Publication number: 20130258478
    Abstract: A method of fabrication of a micro-optics device included providing a layer of material; patterning the layer of material by one or more of: locally unzipping and desorbing molecules thereof, with a nano-scale dimensioned probe, to obtain a curved surface for the layer of material, the curved surface having a curved profile in a plane section; and completing a layer structure perpendicular to the plane section by providing one or more additional layers of material in contact with the curved surface to obtain the micro-optics device, wherein the micro-optics device has the layer structure, with a given layer thereof comprising a defect delimited by two surfaces, wherein one of the two surfaces is the curved surface.
    Type: Application
    Filed: March 11, 2013
    Publication date: October 3, 2013
    Applicant: International Business Machines Corporation
    Inventors: Fei Ding, Urs T. Duerig, Armin W. Knoll, Rainer F. Mahrt, Thilo H. Stoeferle
  • Patent number: 8488436
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.
    Type: Grant
    Filed: February 3, 2012
    Date of Patent: July 16, 2013
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles-Gordon Wade
  • Patent number: 8450043
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: May 28, 2013
    Assignee: International Business Machines Corporation
    Inventors: Daniel J. Coady, Urs T. Duerig, Jane E. Frommer, Kazuki Fukushima, James L. Hedrick, Armin W. Knoll
  • Patent number: 8389205
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Grant
    Filed: June 11, 2009
    Date of Patent: March 5, 2013
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Jane E. Frommer, Bernd W. Gotsmann, James L. Hedrick, Armin W. Knoll, Robert D. Miller, David Pires, Charles G. Wade
  • Patent number: 8383756
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: February 26, 2013
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 8374071
    Abstract: The present invention relates to a data storage device comprising: a polymer layer for storing data in the form of topographic features; a substrate comprising a conductor, a first surface of the polymer layer being provided on the substrate; and at least one probe which, when the device is in use, interacts with a second surface of the polymer layer, wherein, when in use, the data storage device is operable to apply a first electrical potential to the at least one probe relative to the substrate, thereby to cause a protrusion to be formed on the second surface of the polymer layer.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: February 12, 2013
    Assignee: International Business Machines Corporation
    Inventors: Bernd W. Gotsmann, Armin W. Knoll, Urs T. Duerig
  • Patent number: 8369204
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: February 5, 2013
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade, Johannes Windeln
  • Publication number: 20130009287
    Abstract: The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate.
    Type: Application
    Filed: September 7, 2012
    Publication date: January 10, 2013
    Applicant: International Business Machines Corporation
    Inventors: Urs T. Duerig, Felix Holzner, Cyrill Kuemin, Armin W. Knoll, Philip Paul, Heiko Wolf
  • Publication number: 20120328773
    Abstract: The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate.
    Type: Application
    Filed: April 26, 2012
    Publication date: December 27, 2012
    Applicant: International Business Machines Corporation
    Inventors: Urs T. Duerig, Felix Holzner, Cyrill Kuemin, Armin W. Knoll, Philip Paul, Heiko Wolf
  • Patent number: 8337954
    Abstract: A composition and a method. The method including: heating one or more poly(aryl ether ketone) copolymers to form a poly(aryl ether ketone) resin, said poly(aryl ether ketone) resin covalently cross-linked by cyclo-addition reactions of said phenylethynyl moieties; and wherein each of said one or more poly(aryl ether ketone) copolymers comprises (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, said moiety capable of forming two or more hydrogen bonds at room temperature, each of said one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: December 25, 2012
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
  • Publication number: 20120301672
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Application
    Filed: August 9, 2012
    Publication date: November 29, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Daniel J. Coady, Urs T. Duerig, Jane E. Frommer, Kazuki Fukushima, James L. Hedrick, Armin W. Knoll
  • Publication number: 20120297905
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Application
    Filed: August 9, 2012
    Publication date: November 29, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Daniel J. Coady, Urs T. Duerig, Jane E. Frommer, Kazuki Fukushima, James L. Hedrick, Armin W. Knoll
  • Patent number: 8289833
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: October 16, 2012
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade, Johannes Windeln