Abstract: A system for supplying water vapor in a process for treatment of a semiconductor wafer, comprising a treatment chamber having an interior for receiving at least one semiconductor wafer and a water vapor dispenser. The water vapor dispenser comprises i) a hot water source, ii) a water vapor separator, iii) a first conduit fluidly connecting the hot water source to the water vapor separator, iii) a fluid control valve in the first conduit controlling the flow of fluid between the hot water source and the water vapor separator, and iv) a second conduit fluidly connecting the water vapor separator to the treatment chamber for delivery of water vapor to the interior of the treatment chamber.

Abstract: Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from rinsing to drying). At least a portion of residual liquid remaining in fluid supply lines after a wet treatment is removed via a pathway that avoids purging directly onto the substrates. Related methods are also included in the present invention.

Abstract: Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from rinsing to drying). At least a portion of residual liquid remaining in fluid supply lines after a wet treatment is removed via a pathway that avoids purging directly onto the substrates. Related methods are also included in the present invention.

Abstract: A rotary union having a housing, a rotor, and a post such that a fluid can be conveyed through the rotary union. The rotor is rotatably coupled to the housing, preferably by at least one bearing interposed between a portion of the rotor exterior and a portion of the housing interior. The post is positioned in the rotary union in a manner effective to help fluidly couple the rotor to the housing and such that an annular gap surrounds at least a portion of the post such that the annular gap constitutes at least a portion of a drain fluid pathway. The present invention also includes fluid delivery systems including such rotary unions and methods of making and/or using such rotary unions.

Abstract: A valve and a valve assembly are provided that exhibit both highly controlled metering of fluid, as well as a high volume of fluid flow when the valve is in the fully open position. The regulating portion of the valve is provided with channels having different cross-sectional shapes, or channels having different lengths to provide staged flow. The valve is further provided with a fluid boundary element that is movably operably connected to the valve for mounting the valve to the valve body.

Abstract: A valve and a valve assembly are provided that exhibit both highly controlled metering of fluid, as well as a high volume of fluid flow when the valve is in the fully open position. The regulating portion of the valve is provided with channels having different cross-sectional shapes, or channels having different lengths to provide staged flow. The valve is further provided with a fluid boundary element that is movably operably connected to the valve for mounting the valve to the valve body.