Patents by Inventor Arno Jan Bleeker
Arno Jan Bleeker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11942302Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.Type: GrantFiled: December 17, 2019Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Pieter Willem Herman De Jager, Maikel Robert Goosen, Erwin Paul Smakman, Albertus Victor Gerardus Mangnus, Yan Ren, Adam Lassise
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Publication number: 20230154722Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.Type: ApplicationFiled: December 17, 2019Publication date: May 18, 2023Inventors: Arno Jan BLEEKER, Pieter Willem Herman DE JAGER, Maikel Robert GOOSEN, Erwin Paul SMAKMAN, Albertus Victor Gerardus MANGNUS, Yan REN, Adam LASSISE
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Patent number: 11525786Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: March 4, 2021Date of Patent: December 13, 2022Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cédric Désiré Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 10955353Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: February 7, 2019Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 10712667Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.Type: GrantFiled: November 16, 2017Date of Patent: July 14, 2020Assignee: ASML Netherlands B.V.Inventors: Sumant Sukdew Ramanujan Oemrawsingh, Arno Jan Bleeker, Alexander Matthijs Struycken, Engelbertus Antonius Fransiscus Van Der Pasch, Bert Pieter Van Drieënhuizen
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Publication number: 20190377267Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.Type: ApplicationFiled: November 16, 2017Publication date: December 12, 2019Applicant: ASML Netherlands B.V.Inventors: Sumant Sukdew Ramanujan OEMRAWSINGH, Arno Jan BLEEKER, Alexander Matthijs STRUYCKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Bert Pieter VAN DRIEËNHUIZEN
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Publication number: 20190170657Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: ApplicationFiled: February 7, 2019Publication date: June 6, 2019Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria DEN BOEF, Arno Jan BLEEKER, Youri Johannes Laurentiu VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cedric Desire GROUWSTRA, Markus Gerardus Martinus VAN KRAAIJ
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Patent number: 10241055Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: April 29, 2014Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij
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Patent number: 10222702Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: GrantFiled: January 21, 2016Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
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Patent number: 9946167Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.Type: GrantFiled: August 12, 2015Date of Patent: April 17, 2018Assignee: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde Smilde, Arno Jan Bleeker, Willem Marie Julia Marcel Coene, Patrick Warnaar, Michael Kubis
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Publication number: 20180031979Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: ApplicationFiled: January 21, 2016Publication date: February 1, 2018Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
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Patent number: 9823576Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.Type: GrantFiled: January 27, 2014Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Dries Smeets, Arno Jan Bleeker, Christopher James Lee, Pieter Willem Herman De Jager, Heine Melle Mulder, Rudy Jan Maria Pellens
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Patent number: 9715183Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.Type: GrantFiled: January 24, 2013Date of Patent: July 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Wouter Dick Koek, Arno Jan Bleeker, Erik Roelof Loopstra, Heine Melle Mulder, Erwin John Van Zwet, Dries Smeets, Robert Paul Ebeling
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Patent number: 9696636Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.Type: GrantFiled: November 6, 2012Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Arno Jan Bleeker, Erik Roelof Loopstra
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Patent number: 9690210Abstract: A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.Type: GrantFiled: July 20, 2012Date of Patent: June 27, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Arno Jan Bleeker, Laurentius Cornelius De Winter
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Patent number: 9594304Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.Type: GrantFiled: February 5, 2013Date of Patent: March 14, 2017Assignee: ASML Netherlands B.V.Inventors: Martinus Hendricus Henricus Hoeks, Arno Jan Bleeker
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Patent number: 9568831Abstract: A lithographic or exposure apparatus has a projection system and a controller. The projection system includes a stationary part and a moving part. The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.Type: GrantFiled: December 20, 2012Date of Patent: February 14, 2017Inventors: Patricius Aloysius Jacobus Tinnemans, Arno Jan Bleeker
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Patent number: 9513561Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.Type: GrantFiled: March 16, 2012Date of Patent: December 6, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Arno Jan Bleeker, Martinus Hendricus Henricus Hoeks, Theodorus Petrus Maria Cadee
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Publication number: 20160349628Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.Type: ApplicationFiled: August 12, 2016Publication date: December 1, 2016Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Thomas Josephus Maria CASTENMILLER, Pieter Willem Herman DEJAGER, Heine Melle MULDER, Koen Jacobus Johannes ZAAL, Theodorus Petrus Maria CADEE, Danny Maria Hubertus PHILIPS, Ruud Antonius Catharina Maria BEERENS, Roger Anton Marie TIMMERMANS
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Patent number: 9494869Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.Type: GrantFiled: December 5, 2012Date of Patent: November 15, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch