Patents by Inventor Arpan Mahorowila

Arpan Mahorowila has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon-containing compositions for spin-on arc/hardmask materials
    Publication number: 20060058489
    Abstract: Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
    Type: Application
    Filed: October 31, 2005
    Publication date: March 16, 2006
    Applicant: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Arpan Mahorowila, Wayne Moreau, Dirk Pfeiffer, Ratnam Sooriyekumaren
  • Silicon-containing compositions for spin-on arc/hardmask materials
    Publication number: 20050074689
    Abstract: Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
    Type: Application
    Filed: October 6, 2003
    Publication date: April 7, 2005
    Inventors: Marie Angelopoulos, Wu-Song Huang, Arpan Mahorowila, Wayne Moreau, Dirk Pfeiffer, Ratnam Scooriyakumaren