Abstract: A method of bonding layers of dielectric materials includes providing a surface one of the layers with microscale- and/or nanoscale-size bonding elements forming contact points of the layers and bringing a layer of the layers into a mutual position according to an intended use. The method also includes illuminating the layer whose surface is provided with bonding elements by an incident electromagnetic wave, the propagation direction of which is substantially orthogonal to the one of the layers, and whose wavelength is selected depending on an absorption spectrum of a material forming the one of the layers and generating condensed optical beams within said bonding elements or close to a tip of said bonding elements intended to be in contact with the other layer. The method further includes heating and melting the bonding elements by high-intensity focal spots formed by said generated optical beams and maintaining the layers into a mutual position until and bonding of the layers.

Abstract: The present disclosure concerns a device for forming at least one focused beam in a near zone, from an electromagnetic wave incident on said device. Such device is remarkable in that it comprises at least one layer of a dielectric material comprising at least partially a first element, said first element having a first refractive index value, said first element comprising at least partially a second element, said second element having a second refractive index value greater than said first index value, and wherein said second element comprises at least a base surface, defined with respect to an arrival direction of said electromagnetic wave, and wherein said at least a base surface comprises at least two opposite edge line segments whose shape and associated base angles between said at least a base surface and a lateral surface of said second element, in a vertical plane with respect to said at least a base surface, control a shape of said at least one focused beam.

Abstract: In one embodiment of the disclosure, it is proposed a photolithography device for generating structure on a photoresist substrate, the photolithography device comprising a light illumination unit and a photomask. The photomask is remarkable in that it comprises at least one layer of dielectric material and a medium having a refractive index lower than that of said dielectric material, wherein a surface of said at least one layer of dielectric material has at least one abrupt change of level forming a step, and wherein at least a base and lateral part of said surface, with respect to said step and a propagation direction of an electromagnetic wave from said light illumination unit, is in contact with said medium.

Abstract: The present disclosure concerns an image sensor comprising at least one sensing unit, said at least one sensing unit comprising means for converting light into a readable electric signal. The image sensor is remarkable in that said at least one sensing unit comprises light guiding means for guiding light in direction to said means for converting light into a readable electric signal, said light guiding means comprising: at least one layer of a dielectric material, having a first refractive index with a surface having at least one abrupt change of level forming a step, and an element having a second refractive index lower than said first refractive index, which is in contact with said step.

Abstract: A device for shielding at least one sub-wavelength-scale object from an electromagnetic wave, which is incident on said device, comprises at least one layer of a dielectric material, a surface of which having at least one abrupt change of level forming a step. At least a lower and lateral part of the surface with respect to the step is in contact with a medium having a refractive index lower than that of the dielectric material. The at least one sub-wavelength-scale object is located within the device in a quiet zone where an electromagnetic field intensity is below a threshold, the quiet zone extending above said surface, in the vicinity of the step, in a direction of incidence of said electromagnetic wave.

Abstract: In one embodiment of the disclosure, it is proposed a photolithography device for generating structure on a photoresist substrate, the photolithography device comprising a light illumination unit and a photomask. The photomask is remarkable in that it comprises at least one layer of dielectric material and a medium having a refractive index lower than that of said dielectric material, wherein a surface of said at least one layer of dielectric material has at least one abrupt change of level forming a step, and wherein at least a base and lateral part of said surface, with respect to said step and a propagation direction of an electromagnetic wave from said light illumination unit, is in contact with said medium.

Abstract: The present disclosure concerns a device for forming a field intensity pattern in the near zone, from electromagnetic waves which are incident on said device. Notably, such a device allows confining electromagnetic waves, which are incident on the device, into beams of radiation in the near zone. It comprises at least one layer of dielectric material, which surface has at least one abrupt change of level forming a step. A lower and lateral part of said surface with respect to said step is in contact with a substance having a refractive index lower than that of said dielectric material. For an incident electromagnetic wave impinging upon the device in the vicinity of such a step, the corresponding step of index it encounters produces a complex electromagnetic phenomenon, which allows generating low-dispersive condensed beams and specific field patterns in the near zone.

Abstract: The present disclosure concerns a device for forming at least one focused beam in a near zone, from an electromagnetic wave incident on said device. Such device is remarkable in that it comprises at least one layer of a dielectric material comprising at least partially a first element, said first element having a first refractive index value, said first element comprising at least partially a second element, said second element having a second refractive index value greater than said first index value, and wherein said second element comprises at least a base surface, defined with respect to an arrival direction of said electromagnetic wave, and wherein said at least a base surface comprises at least two opposite edge line segments whose shape and associated base angles between said at least a base surface and a lateral surface of said second element, in a vertical plane with respect to said at least a base surface, control a shape of said at least one focused beam.

Abstract: Some embodiments relate to a device for simulating characteristics of human tissues in electromagnetic dosimetry. The device includes a substrate bearing a metallised shielding, a layer of a dielectric material arranged on or preferentially beneath the substrate and the device including a plurality of openings made in the shielding and at least one array of sensors in the layer of dielectric material.