Patents by Inventor Arthur Kenichi Yasuda

Arthur Kenichi Yasuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110139755
    Abstract: Multi-wavelength laser-scribing systems are disclosed. A system for scribing a workpiece includes a frame, a translation stage coupled with the frame to support the workpiece and translate the supported workpiece relative to the frame in a longitudinal direction, at least one laser operable to generate a first output having a first wavelength and generate a second output having a second wavelength, and at least one scanning device coupled with the frame and operable to control a position of the first and second outputs. Each of the first and second outputs are able to remove material from at least a portion of the workpiece. Laser assemblies that each include a laser and at least one scanning device can be arranged in rows to enhance the rate at which latitudinal scribe lines are formed.
    Type: Application
    Filed: November 3, 2010
    Publication date: June 16, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Antoine P. Manens, Wei-Yung Hsu, Manivannan Thothadri, Arthur Kenichi Yasuda
  • Patent number: 5679215
    Abstract: Surfaces having semiconductor oxides, metal oxides and hydrocarbons deposited thereon in a vacuum plasma processing chamber are in situ cleaned by introducing water vapor and SF.sub.6 and/or NF.sub.3 gas in the presence of a plasma discharge. The vapor and gas react to form gaseous HF, and an acidic gas including at least one of H.sub.2 SO.sub.4 and HNO.sub.3. The discharge ionizes and dissociates the HF and acidic gases to form gaseous reactants for the deposits. The reactants chemically react with the deposits, including the oxides and hydrocarbons, to vaporize these deposits. The vaporized deposits are pumped out of the chamber by the same pump which normally evacuates the chamber to a vacuum. Oxygen and/or H.sub.2 O.sub.2 vapors are introduced in the presence of the plasma to additionally clean the surfaces.
    Type: Grant
    Filed: January 2, 1996
    Date of Patent: October 21, 1997
    Assignee: Lam Research Corporation
    Inventors: Michael S. Barnes, Arthur Kenichi Yasuda