Patents by Inventor Arthur Pan

Arthur Pan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EVANESCENT OR FUGACIOUS THRUST DEFLECTOR
    Publication number: 20240151194
    Abstract: An ablative thruster includes a nozzle configured to control a flow of thrust from the satellite. The ablative thruster also includes an ablative surface inside of the nozzle, configured to deflect the thrust at a predefined angle. The ablative surface is configured to ablate-away, leaving un-deflected thrust for a majority of the burn.
    Type: Application
    Filed: November 7, 2022
    Publication date: May 9, 2024
    Applicant: The Aerospace Corporation
    Inventors: Jerome K. FULLER, Denise Galindo BURRELL, Edward V. WAGNER, Andrew C. CORTOPASSI, Jeffrey Arthur LANG, Robert B. PAN
  • DYNAMIC FOVEATED PIPELINE
    Publication number: 20240087080
    Abstract: In one implementation, a method includes receiving a warped image representing simulated reality (SR) content (e.g., to be displayed in a display space), the warped image having a plurality of pixels at respective locations uniformly spaced in a grid pattern in a warped space, wherein the plurality of pixels are respectively associated with a plurality of respective pixel values and a plurality of respective scaling factors indicating a plurality of respective resolutions at a plurality of respective locations of the SR content (e.g., in the display space). The method includes processing the warped image in the warped space based on the plurality of respective scaling factors to generate a processed warped image and transmitting the processed warped image.
    Type: Application
    Filed: November 16, 2023
    Publication date: March 14, 2024
    Inventors: Tobias Eble, Ye Cong, Cody J. White, Arthur Yasheng Zhang, Randall Rauwendaal, Moinul Khan, Jim C. Chou, Hao Pan, Nicolas Bonnier
  • Method to manufacture a thin film resistor
    Patent number: 7838429
    Abstract: A method for manufacturing a semiconductor device that method comprises forming a thin film resistor by a process that includes depositing a resistive material layer on a semiconductor substrate. The process also includes depositing an insulating layer on the resistive material layer, and performing a first dry etch process on the insulating layer to form an insulative body. The process further includes performing a second dry etch process on the resistive material layer to form a resistive body. The resistive body and the insulative body have substantially identical perimeters.
    Type: Grant
    Filed: July 18, 2007
    Date of Patent: November 23, 2010
    Assignee: Texas Instruments Incorporated
    Inventors: Tony Phan, Kyle M. Flessner, Martin B. Mollat, Connie Wang, Arthur Pan, Eric William Beach, Michelle R. Keramidas, Karen Elizabeth Burks
  • METHOD TO MANUFACTURE A THIN FILM RESISTOR
    Publication number: 20090023263
    Abstract: A method for manufacturing a semiconductor device that method comprises forming a thin film resistor by a process that includes depositing a resistive material layer on a semiconductor substrate. The process also includes depositing an insulating layer on the resistive material layer, and performing a first dry etch process on the insulating layer to form an insulative body. The process further includes performing a second dry etch process on the resistive material layer to form a resistive body. The resistive body and the insulative body have substantially identical perimeters.
    Type: Application
    Filed: July 18, 2007
    Publication date: January 22, 2009
    Applicant: Texas Instruments Incorporated
    Inventors: Tony Phan, Kyle M. Flessner, Martin B. Mollat, Connie Wang, Arthur Pan, Eric William Beach, Michelle R. Keramidas, Karen Elizabeth Burks