Abstract: In an aspect, an elevated lookout apparatus is disclosed. The apparatus may comprise at least a housing mounted in an elevated location. The apparatus may additionally include a plurality of cameras positioned radially within the at least a housing in a manner to create a combined field of view, wherein each camera of the plurality of cameras is configured a generate image data. The apparatus may also include at least a processor communicatively connected to the plurality of cameras. The processor may be configured receive the image data from each camera of the plurality of cameras. The processor may also be configured to combine the image data from each camera of the plurality of cameras into a combined video using an image machine learning model.

Abstract: An automated manufacturing system for generating a graphical representation of a discrete object to be manufactured from an additively manufactured body of material. Reference feature is used to place the precursor at a subtractive manufacturing machine; the reference feature may be based on a locating feature at the subtractive manufacturing machine. Manufacturing reference feature is accomplished by automatedly detecting one or more critical-to-quality features and manufacturing the reference feature based on the one or more detected critical-to-quality features.

Abstract: A method of generating a three-dimensional product having a cubic internal structure in a process controlled by a computing device. The method comprises receiving a manufacturing request datum from a user client device, wherein the manufacturing request datum further comprises at least an element of a product definition. The method further comprises defining a lattice volume of the manufacturing request datum, wherein defining the at least a lattice volume further comprises defining at least a lattice cell, wherein the at least a lattice cell is comprised within the lattice volume. The method further comprises determining a response characteristic of each lattice cell of the plurality of lattice cells, wherein determining a response characteristic further comprises simulating the application of at least a force on at least a part of the manufacturing request datum as a function of the product definition. The method further comprises selecting a unit structure.

Abstract: An automated manufacturing system for generating a graphical representation of a discrete object to be manufactured from an additively manufactured body of material. Reference feature is used to place the precursor at a subtractive manufacturing machine; the reference feature may be based on a locating feature at the subtractive manufacturing machine. Manufacturing reference feature is accomplished by automatedly detecting one or more critical-to-quality features and manufacturing the reference feature based on the one or more detected critical-to-quality features.

Abstract: An automated manufacturing system for manufacturing a discrete object is configured to manufacture a reference feature on a precursor to the discrete object. Reference feature is used to place the precursor at a subtractive manufacturing machine; the reference feature may be based on a locating feature at the subtractive manufacturing machine. Manufacturing reference feature is accomplished by automatedly detecting one or more critical-to-quality features and manufacturing the reference feature based on the one or more detected critical-to-quality features.

Abstract: An automated manufacturing system for manufacturing a discrete object is configured to manufacture a reference feature on a precursor to the discrete object. Reference feature is used to place the precursor at a subtractive manufacturing machine; the reference feature may be based on a locating feature at the subtractive manufacturing machine. Manufacturing reference feature is accomplished by automatedly detecting one or more critical-to-quality features and manufacturing the reference feature based on the one or more detected critical-to-quality features.

Abstract: An autonomous vehicle control system for use on a vehicle, such as a motorcycle or an all-terrain vehicle (ATV) to autonomously control the vehicle without a driver during vehicle testing is provided. The vehicle control system comprises a moment generator coupleable to the vehicle and configured to selectively generate a moment in either of first and second directions. The vehicle control system also includes a control system operably coupled to the moment generator and configured to control the moment generator to selectively impart moments on the vehicle to stabilize the vehicle or to introduce disturbances on the vehicle.

Abstract: An autonomous vehicle control system for use on a vehicle, such as a motorcycle or an all-terrain vehicle (ATV) to autonomously control the vehicle without a driver during vehicle testing is provided. The vehicle control system comprises a moment generator coupleable to the vehicle and configured to selectively generate a moment in either of first and second directions. The vehicle control system also includes a control system operably coupled to the moment generator and configured to control the moment generator to selectively impart moments on the vehicle to stabilize the vehicle or to introduce disturbances on the vehicle.

Abstract: A polishing pad includes a polishing layer and an adhesive layer. An adhesive bottom surface of the adhesive layer has an air transmitting pathway to collect air that is expelled from under the adhesive bottom surface, which avoids entrapment of air under the adhesive bottom surface.

Abstract: A polishing pad having a soft layer with a porous structure impregnated with a relatively hard material that locally deforms irreversibly under polishing pressure to a substantially flat polishing pad surface.

Abstract: The invention is directed to a base-pad for placement under a polishing pad for use with a polishing fluid during a polishing operation, the base-pad having a layer with vertical elongated pores that absorb polishing fluid and that confine absorbed polishing fluid from transport laterally in the base-pad. Micropores in the layer are impermeable to the polishing fluid and permeable to gasses.

Abstract: This invention describes improved polishing pads useful in the manufacture ofsemiconductor devices or the like. The pads of the present invention may have an advantageous hydrophilic polishing material and are sufficiently thin to generally improve predictability and polishing performance.

Abstract: A polishing pad apparatus includes, a polishing pad, an optically transmissive window framed by an opening through the polishing pad, the window being part of an underlay, and the underlay having a perimeter that extends substantially beyond the perimeter of the window to form a fluid impermeable layer that isolates a rear surface of the window from obstruction by polishing fluid.

Abstract: A polishing pad is provided comprising an upper surface and a lower surface, substantially parallel to one another, wherein the pad has enhanced flexibility produced by scoring of either or both surfaces. The pad thickness is generally greater than 500 &mgr;. The scoring creates slits having a depth of less than 90% of the thickness.

Abstract: This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention may have an advantageous hydrophilic polishing material and are sufficiently thin to generally improve predictability and polishing performance.

Abstract: A system and method for semiconductor processing using magnetorheological finishing (MRF) includes polishing of semiconductor substrates, ceramic bodies and glass lithography masks, to a high degree of flatness by the abrasive action of a magnetorheological fluid flowing in a magnetic field.

Abstract: The invention is directed to a base-pad for placement under a polishing pad for use with a polishing fluid during a polishing operation, the base-pad having a layer with vertical elongated pores that absorb polishing fluid and that confine absorbed polishing fluid from transport laterally in the base-pad. Micropores in the layer are impermeable to the polishing fluid and permeable to gasses.

Abstract: A polishing pad is provided comprising an upper surface and a lower surface, substantially parallel to one another, wherein the pad has enhanced flexibility produced by scoring of either or both surfaces. The pad thickness is generally greater than 500 &mgr;. The scoring creates slits having a depth of less than 90% of the thickness.

Abstract: This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and are sufficiently thin to generally improve predictability and polishing performance.

Abstract: A polishing pad having a soft layer with a porous structure impregnated with a relatively hard material that locally deforms irreversibly under polishing pressure to a substantially flat polishing pad surface.