Patents by Inventor Arto Salokatve

Arto Salokatve has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080025363
    Abstract: An active multimode optical fiber consisting of a first core section (11), a thin barrier layer (12) material having a thickness (d2) and a lower refractive index than that of the first core section by an index difference (?n), a second core section (13) having a refrective index equal or higher than that of the first core section, and a cladding (14) having an index lower than that of the first core section. Said index difference and said thickness are selected so that a fundamental core mode couples less strongly with said cladding modes than higher order core modes. A scheme of changing the symmetry of the fiber for reduced sensitivity of the fundamental mode of the first core section to resonance effects.
    Type: Application
    Filed: July 27, 2005
    Publication date: January 31, 2008
    Inventors: Kalle Yla-jarkko, Arto Salokatve
  • Patent number: 5914491
    Abstract: The object of the invention is a photon or particle detector which comprises a transmission dynode situated in a vacuum. The detector comprises a monolithically fabricated semiconductor structure in which electrons are arranged so as to travel from the semiconductor into a vacuum. At least a part of the multiplication region is formed into a layered structure incorporating at least one doped semiconductor transmission dynode and at least one vacuum space.
    Type: Grant
    Filed: November 19, 1996
    Date of Patent: June 22, 1999
    Inventors: Arto Salokatve, Mika Toivonen, Marko Jalonen, Hannu Kojola, Markus Pessa
  • Patent number: 4876218
    Abstract: The invention relates to a method of growing a GaAs film on the surface of a Si or GaAs substrate by exposing the growing surface of the substrate in a vacuum to at least one vapor beam containing the Ga elementary component of the GaAs compound, and to at least one vapor beam containing the As elementary component of the GaAs compound. The method is characterized by the steps of (A) growing a GaAs buffer layer by alternately applying the elements of the GaAs compound to the surface of a substrate heated to a first temperature one atom layer at a time, whereby in the formation of each atom layer the growing surface is exposed to a vapour beam containing one elementary component of the GaAs compound only; and (B) heating the substrate to a second temperature higher than the first temperature, and growing another GaAs layer on the buffer layer by applying both of the elementary components of the GaAs compound simultaneously.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: October 24, 1989
    Assignee: Oy Nokia Ab
    Inventors: Markus Pessa, Harry Asonen, Jukka Varrio, Arto Salokatve