Patents by Inventor Ashish Bhatnagar

Ashish Bhatnagar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230356353
    Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
    Type: Application
    Filed: July 12, 2023
    Publication date: November 9, 2023
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Publication number: 20230339507
    Abstract: Approaches to utilizing contextual right-of-way decision making for autonomous vehicles are disclosed. An autonomous vehicle is operated in a road setting within an operating environment having other road users. The operation of the autonomous vehicle is based on safety constraints providing limits on operation of the autonomous vehicle. The presence of a selected other road user within the operating environment is detected. Potential trajectories for the autonomous vehicle within the operating environment are evaluated with respect to the other road user. The autonomous vehicle interacts with the other road user by generating vehicle control signals based on a machine learned model and within the one or more safety constraints. The machine learned model is based on a hierarchy of costs corresponding to characteristics of maneuvers by the autonomous vehicle.
    Type: Application
    Filed: April 20, 2022
    Publication date: October 26, 2023
    Applicant: GM CRUISE HOLDINGS LLC
    Inventors: Sasanka Nagavalli, Nenad Uzunovic, Ashish Bhatnagar
  • Patent number: 11738421
    Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
    Type: Grant
    Filed: April 26, 2021
    Date of Patent: August 29, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Patent number: 11592843
    Abstract: A technique relates to autonomous obstacle avoidance. A vehicle is controlled on a route to a destination, the route being a three-dimensional route. An obstruction is determined on the global route. A local route including alternate points to avoid the obstruction is autonomously determined. The local route is autonomously converged back to the global route in response to avoiding the obstruction.
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: February 28, 2023
    Assignee: LOCKHEED MARTIN CORPORATION
    Inventors: Navid Dadkhah Tehrani, Brian Henri Le Floch, Ashish Bhatnagar, Suraj Unnikrishnan, Brian Scott MacAllister, Igor Cherepinsky
  • Publication number: 20220361296
    Abstract: A metal heater includes a metal substrate with a groove, a resistive heater disposed within the groove, and a fill metal disposed over the resistive heater and substantially filling the groove, wherein the fill metal has a lower melting temperature than the metal substrate. The fill metal can be indium and a cover plate can be bonded to the metal substrate and over the indium. A method of manufacturing the metal heater and a method of operating the metal heater are also provided.
    Type: Application
    Filed: May 4, 2022
    Publication date: November 10, 2022
    Applicant: Watlow Electric Manufacturing Company
    Inventors: Ashish BHATNAGAR, Brent ELLIOT
  • Publication number: 20210318697
    Abstract: A technique relates to autonomous obstacle avoidance. A vehicle is controlled on a route to a destination, the route being a three-dimensional route. An obstruction is determined on the global route. A local route including alternate points to avoid the obstruction is autonomously determined. The local route is autonomously converged back to the global route in response to avoiding the obstruction.
    Type: Application
    Filed: April 8, 2020
    Publication date: October 14, 2021
    Inventors: Navid Dadkhah Tehrani, Brian Henri Le Floch, Ashish Bhatnagar, Suraj Unnikrishnan, Brian Scott MacAllister, Igor Cherepinsky
  • Publication number: 20210245323
    Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
    Type: Application
    Filed: April 26, 2021
    Publication date: August 12, 2021
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Patent number: 11007619
    Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: May 18, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Publication number: 20200381286
    Abstract: A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.
    Type: Application
    Filed: August 5, 2020
    Publication date: December 3, 2020
    Inventors: Young J. Paik, Melvin Barrentine, Abhijit Y. Desai, Hai Nguyen, Ashish Bhatnagar, Rajkumar Alagarsamy
  • Publication number: 20190118336
    Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
    Type: Application
    Filed: December 20, 2018
    Publication date: April 25, 2019
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Patent number: 10177014
    Abstract: An apparatus for a substrate support heater and associated chamber components having reduced energy losses are provided. In one embodiment, a substrate support heater is provided. The substrate support heater includes a heater body having a first surface to receive a substrate and a second surface opposing the first surface, a heating element disposed in the heater body between the first surface and the second surface, and a thermal barrier disposed on the second surface of the heater body, wherein the thermal barrier comprises a first layer and a second layer disposed on the first layer.
    Type: Grant
    Filed: October 9, 2013
    Date of Patent: January 8, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Govinda Raj, Daniel Martin, Robert T. Hirahara, Ashish Bhatnagar, Bopanna Vasanth, Prashanth Rao, Kadthala R. Narendrnath
  • Patent number: 10168229
    Abstract: Embodiments disclosed herein generally relate to a temperature sensor disposed in an apparatus. In many semiconductor, liquid crystal display, solar panel or organic light emitting display fabrication processes, RF power is utilized to either ignite a plasma within the processing chamber or to provide supplemental energy to the process. Temperature control during many processes may be beneficial in order to produce a consistent product. Temperature sensors or thermocouples are sometimes utilized to measure the temperature of a substrate within a processing chamber. The RF power may have a negative impact on the temperature sensor. By coating the temperature sensor with a nanoparticle based metal coating, such as a silver coating, the negative impacts of the RF power on the temperature sensor may be reduced without contaminating the process, and an accurate temperature measurement may be obtained.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: January 1, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Govinda Raj, Bopanna Ichettria Vasantha, Ashish Bhatnagar, Cariappa Baduvamanda
  • Patent number: 10160093
    Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: December 25, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Patent number: 10131126
    Abstract: Methods for fabricating and refurbishing an assembly are disclosed herein. The method begins by applying an adhesive layer onto a first substrate. A second substrate is placed onto the adhesive layer, thereby securing the two substrates together, the adhesive layer bounding at least one side of a channel that extends laterally between the substrates to an exterior of the assembly. And, the substrates and the adhesive layer are subjected to a bonding procedure and allowing outgassing of volatiles from the adhesive layer to escape from between the substrates through the channel, wherein the substrates bonded by the adhesive layer form a component for a semiconductor vacuum processing chamber.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: November 20, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Kadthala Ramaya Narendrnath, Gangadhar Sheelavant, Monika Agarwal, Ashish Bhatnagar
  • Patent number: 9960019
    Abstract: The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring body having a top planar surface and a bottom planar surface, and an outer ring body having a top surface, a bottom surface substantially parallel to the top surface, and an inside surface that extends between the top surface and the bottom surface, the inside surface having a roof covering a portion of the inner ring body when the inner ring body is disposed adjacent the roof, wherein the inner ring body can be flipped into a different position so that a portion of the inner ring body that is not covered by the roof provides a substantially planar surface.
    Type: Grant
    Filed: May 6, 2014
    Date of Patent: May 1, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Sandhya Arun, Prashanth Kodigepalli, Padma Gopalakrishnan, Ashish Bhatnagar, Dan Martin, Christopher Heath John Hossack
  • Publication number: 20180017447
    Abstract: Embodiments disclosed herein generally relate to a temperature sensor disposed in an apparatus. In many semiconductor, liquid crystal display, solar panel or organic light emitting display fabrication processes, RF power is utilized to either ignite a plasma within the processing chamber or to provide supplemental energy to the process. Temperature control during many processes may be beneficial in order to produce a consistent product. Temperature sensors or thermocouples are sometimes utilized to measure the temperature of a substrate within a processing chamber. The RF power may have a negative impact on the temperature sensor. By coating the temperature sensor with a nanoparticle based metal coating, such as a silver coating, the negative impacts of the RF power on the temperature sensor may be reduced without contaminating the process, and an accurate temperature measurement may be obtained.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 18, 2018
    Inventors: Govinda RAJ, Bopanna Ichettria VASANTHA, Ashish BHATNAGAR, Cariappa BADUVAMANDA
  • Patent number: 9823133
    Abstract: Embodiments disclosed herein generally relate to a temperature sensor disposed in an apparatus. In many semiconductor, liquid crystal display, solar panel or organic light emitting display fabrication processes, RF power is utilized to either ignite a plasma within the processing chamber or to provide supplemental energy to the process. Temperature control during many processes may be beneficial in order to produce a consistent product. Temperature sensors or thermocouples are sometimes utilized to measure the temperature of a substrate within a processing chamber. The RF power may have a negative impact on the temperature sensor. By coating the temperature sensor with a nanoparticle based metal coating, such as a silver coating, the negative impacts of the RF power on the temperature sensor may be reduced without contaminating the process, and an accurate temperature measurement may be obtained.
    Type: Grant
    Filed: July 17, 2010
    Date of Patent: November 21, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Govinda Raj, Bopanna Ichettria, Ashish Bhatnagar, Cariappa Baduvamanda
  • Publication number: 20170243779
    Abstract: A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.
    Type: Application
    Filed: May 10, 2017
    Publication date: August 24, 2017
    Applicant: Applied Materials, Inc.
    Inventors: Young J. Paik, Melvin Barrentine, Abhijit Y. Desai, Hai Nguyen, Ashish Bhatnagar, Rajkumar Alagarsamy
  • Publication number: 20170173934
    Abstract: Methods for fabricating and refurbishing an assembly are disclosed herein. The method begins by applying an adhesive layer onto a first substrate. A second substrate is placed onto the adhesive layer, thereby securing the two substrates together, the adhesive layer bounding at least one side of a channel that extends laterally between the substrates to an exterior of the assembly. And, the substrates and the adhesive layer are subjected to a bonding procedure and allowing outgassing of volatiles from the adhesive layer to escape from between the substrates through the channel, wherein the substrates bonded by the adhesive layer form a component for a semiconductor vacuum processing chamber.
    Type: Application
    Filed: March 8, 2017
    Publication date: June 22, 2017
    Inventors: Kadthala Ramaya NARENDRNATH, Gangadhar SHEELAVANT, Monika AGARWAL, Ashish BHATNAGAR
  • Patent number: 9627231
    Abstract: Methods for bonding substrates, forming assemblies using the same, along with improved methods for refurbishing said assemblies are disclosed that take advantage of at least one channel formed in an adhesive utilized to join two substrates to improve fabrication, performance and refurbishment of the assemblies. In one embodiment an assembly includes a first substrate secured to a second substrate by an adhesive layer. The assembly includes a channel having at least one side bounded by the adhesive layer and having an outlet exposed to an exterior of the assembly.
    Type: Grant
    Filed: August 30, 2013
    Date of Patent: April 18, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kadthala Ramaya Narendrnath, Gangadhar Sheelavant, Monika Agarwal, Ashish Bhatnagar