Abstract: A plating apparatus used in a diamond plating process in which a first electrode having a surface from which plating material is released is located in connection with a firing electrode to generate a first arc, the first arc being used to start a second arc between the first electrode and a second electrode, and in which apparatus a plasma spray formed from plating material released from the first electrode is directed toward a substrate to be plated includes a grinding element in contact with the surface of the first electrode and a mechanism for rotating the surface of the first electrode. The grinding element may be a firing electrode or an abrading tool. A method of operating the plating apparatus includes abrading the surface of the first electrode from which plating material is released.

Abstract: Procedure and apparatus for the coating of materials. In the procedure the material or substrate (7) is coated by means of a pulsating plasma beam emitted from at least one electrode (1). The plasma beam is accelerated by a magnetic field and deflected by the same to separate the uncharged particles from it, whereupon the plasma beam hits the surface of the material (7) to be coated. The apparatus of the invention for the coating of materials is provided with electrodes (1, 3), at least one voltage source (2) and at least one capacitor (C1) for producing a pulsating plasma beam and at least one deflected coil (4) which generates a magnetic field that accelerates the plasma beam emitted by at least one electrode (1) and deflects the beam to separate the uncharged particles from it.