Abstract: Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IRS's). The IRS's are in a processing positon prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.

Abstract: Embodiments of the present disclosure relate to mount apparatuses for digital micromirror devices of digital lithography systems and methods of mounting the digital micromirror devices. The mount apparatuses described herein retain spatial light modulators, such as DMDs. The mount apparatus enables the flattening of the DMD by providing a force such that the pair of contact pads contact the DMD. The DMD is positioned in a mounting frame of the mount apparatus. Contact pads of the mounting frame are operable to apply pressure to the DMD.