Abstract: A method is disclosed for the preparation of a silicon nitrogeneous film. Polysilazane film is exposed to an electron beam irradiation and subsequently to at least one process selected from the group consisting of a vacuum ultra-violet light irradiation and a plasma processing. The treated film is heated under a non-oxidizing atmosphere to manufacture a silicon nitrogeneous film. The silicon nitrogeneous film is able to be formed at low process temperature. Further, the silicon nitrogeneous film has a high refractive index and low oxygen content.

Abstract: To provide a siliceous film manufacturing composition that can fill a narrow and a high aspect ratio trench and can produce a thick siliceous film. [Means for Solution] The present invention provides a siliceous film manufacturing composition that comprises, (a) a block copolymer having a linear and/or cyclic polysilane backbone block with or more silicon atoms and a polycarbosilane backbone block with or more silicon atoms, and (b) a solvent.

Abstract: A stabilizer represented by the following formula for suppressing generation of silane from a polysilane composition: CH2?CH—R1 wherein R1 is C3-20 linear, branched or cyclic alkyl group, C2-15 linear or branched alkenyl group or C7-20 aryl group substituted with alkenyl group. A invention also relates to a method for suppressing generation of silane and a method for inactivating a polysilane, and a polysilane inactivated treatment composition.

Abstract: To provide an amorphous silicon forming composition, which has high affinity with a substrate. An amorphous silicon forming composition comprising a polysilane having an amino group; and a solvent.

Abstract: According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.

Abstract: To provide a siliceous film manufacturing composition that can fill a narrow and a high aspect ratio trench and can produce a thick siliceous film. [Means for Solution] The present invention provides a siliceous film manufacturing composition that comprises, (a) a block copolymer having a linear and/or cyclic polysilane backbone block with or more silicon atoms and a polycarbosilane backbone block with or more silicon atoms, and (b) a solvent.

Abstract: According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.

Abstract: To provide an amorphous silicon forming composition, which has high affinity with a substrate, is excellent in filling properties, and is capable of forming a thick film. [Means for Solution] An amorphous silicon forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon, and (b) a solvent.

Abstract: The present invention provides a method for producing a novel amorphous silicon sacrifice film and an amorphous silicon forming composition capable of filling trenches having a high aspect ratio to form an amorphous silicon sacrifice film that is excellent in affinity with a substrate. A method for producing an amorphous silicon sacrifice film, comprising (i) polymerizing a cyclic polysilane comprising 5 or more silicon or a composition comprising the cyclic polysilane by light irradiation and/or heating to form a polymer having a polysilane skeleton, (ii) applying an amorphous silicon forming composition comprising said polymer having a polysilane skeleton, polysilazane and a solvent above a substrate to form a coating film, and (iii) heating the coating film in a non-oxidizing atmosphere.

Abstract: To provide a polysiloxane composition capable of suppressing the generation of voids when forming a siliceous film. A polysiloxane composition comprising a polysiloxane; a dicarboxylic acid having the first acid dissociation constant pKa1 of 4.0 or less and represented by the following formula (II): HOOC-L-COOH (II) (wherein, L is a single bond, a hydroxy-substituted or amino-substituted alkylene having 1 to 6 carbon atoms, a substituted or unsubstituted alkenylene having 2 to 4 carbon atoms, a substituted or unsubstituted alkynylene having 2 to 4 carbon atoms, or a substituted or unsubstituted arylene having 6 to 10 carbon atoms); and a solvent.

Abstract: Problems can be solved by a base station to which a location of a mobile station is registered and which performs a radio communication with the MS, and when receiving distribution information, divides the distribution information into N pieces, and incorporates the divided distribution information in N pieces of reception channels to successively transmit them to the MS. It can be achieved by a MS which is in a waiting state of a BS and which performs a radio communication with the BS, and when receiving distribution information which is incorporated in reception channels and divided, stores the distribution information, and when determining completion of the distribution of the distribution information, constructs the N pieces of divided information and displays it.

Abstract: In a wireless communication system wherein at least two communication units employ the TDD wireless communication method based on OFDMA, an OFDM wireless communication method and a wireless communication apparatus are disclosed. The first communication unit transmits a pilot signal over the whole subband zone configured of divisions of a predetermined system band. The second communication unit having a plurality of antennas estimates a propagation path of the subchannels constituting continuous frequency blocks making up a subband from the pilot signal received. The second communication unit determines the array weight used at the time of signal transmission to the first communication unit using the estimation result.

Abstract: The present invention is an electrode of an electric device, having a portion at which a pattern is formed using a photosensitive paste, and a portion at which a pattern is formed using a transfer method. Described is a method in which migration at an electrode portion is curtailed by using a photosensitive paste to form a pattern at areas where electrode width is comparatively large, and by forming a pattern using a transfer method at areas where electrode width becomes narrower.

Abstract: The invention relates to forming an electrically functional pattern on a substrate and to a process for using a photosensitive element in combination with a sheet having a thick film composition applied to a support.

Abstract: The invention relates to forming an electrically functional pattern on a substrate. More specifically, the invention relates to a process for using a photosensitive element in combination with a sheet having a thick film composition applied to a support.

Abstract: A photosensitive conductive paste for electrode formation containing conductive metal particles, a glass binder, a monomer, a photoinitiator, an organic polymer binder, an organic medium and an ultraviolet absorber which does not substantially change reflectance of a paste in a visible light range.

Abstract: A photosensitive conductive paste for electrode formation containing conductive metal particles, a glass binder, a monomer, a photoinitiator, an organic polymer binder, an organic medium and an ultraviolet absorber which does not substantially change reflectance of a paste in a visible light range.

Abstract: A photosensitive conductive paste for electrode formation, containing conductive metal particles, a glass binder, a monomer, a photoinitiator, an organic polymer binder, an organic medium and carbon black.

Abstract: Problems can be solved by a base station to which a location of a mobile station is registered and which performs a radio communication with the MS, and when receiving distribution information, divides the distribution information into N pieces, and incorporates the divided distribution information in N pieces of reception channels to successively transmit them to the MS. It can be achieved by a MS which is in a waiting state of a BS and which performs a radio communication with the BS, and when receiving distribution information which is incorporated in reception channels and divided, stores the distribution information, and when determining completion of the distribution of the distribution information, constructs the N pieces of divided information and displays it.

Abstract: A photosensitive conductive paste for electrode formation containing conductive metal particles, a glass binder, a monomer, a photoinitiator, an organic polymer binder, an organic medium and an ultraviolet absorber which does not substantially change reflectance of a paste in a visible light range.